• 1259 Citations
  • 16 h-Index
19952017

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Erratum: Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))

Park, H. S., Shin, H. H., Sung, M. Y., Choi, W. B., Choi, S. W. & Park, S. Y., 2012 Jul, In : Japanese journal of applied physics. 51, 7 PART 1, 079206.

Research output: Contribution to journalComment/debate