2D photonic crystal TM polarizer fabricated by one-step combined nanoimprint and photolithography

K. H. Choi, J. Huh, Y. Cui, Byeong Kwon Ju, W. Hu, J. B. Lee

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Photonic crystal has been widely investigated since it has a great potential to manipulate the flow of light in ultra compact scale. 2D slab photonic crystals for telecommunication wavelengths (e.g., 1550 nm) have multi-scale structures which are typically micron scale waveguides and deep sub-micron scale air-hole array. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. Such a multi-step lithography process increases fabrication complexity. In this work, we report one-step lithography process to pattern both micron and deep sub-micron features simultaneously using combined-nanoimprint- and-photolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated and characterized.

Original languageEnglish
Title of host publication2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
Pages1638-1641
Number of pages4
DOIs
Publication statusPublished - 2011 Sep 1
Event2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11 - Beijing, China
Duration: 2011 Jun 52011 Jun 9

Other

Other2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
CountryChina
CityBeijing
Period11/6/511/6/9

Fingerprint

Photolithography
Photonic crystals
Lithography
Nanolithography
Fabrication
Telecommunication
Waveguides
Silicon
Wavelength
Air

Keywords

  • hybrid mask mold
  • nanoimprint lithography
  • photolithography
  • Photonic crystals

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Choi, K. H., Huh, J., Cui, Y., Ju, B. K., Hu, W., & Lee, J. B. (2011). 2D photonic crystal TM polarizer fabricated by one-step combined nanoimprint and photolithography. In 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11 (pp. 1638-1641). [5969813] https://doi.org/10.1109/TRANSDUCERS.2011.5969813

2D photonic crystal TM polarizer fabricated by one-step combined nanoimprint and photolithography. / Choi, K. H.; Huh, J.; Cui, Y.; Ju, Byeong Kwon; Hu, W.; Lee, J. B.

2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11. 2011. p. 1638-1641 5969813.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Choi, KH, Huh, J, Cui, Y, Ju, BK, Hu, W & Lee, JB 2011, 2D photonic crystal TM polarizer fabricated by one-step combined nanoimprint and photolithography. in 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11., 5969813, pp. 1638-1641, 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11, Beijing, China, 11/6/5. https://doi.org/10.1109/TRANSDUCERS.2011.5969813
Choi KH, Huh J, Cui Y, Ju BK, Hu W, Lee JB. 2D photonic crystal TM polarizer fabricated by one-step combined nanoimprint and photolithography. In 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11. 2011. p. 1638-1641. 5969813 https://doi.org/10.1109/TRANSDUCERS.2011.5969813
Choi, K. H. ; Huh, J. ; Cui, Y. ; Ju, Byeong Kwon ; Hu, W. ; Lee, J. B. / 2D photonic crystal TM polarizer fabricated by one-step combined nanoimprint and photolithography. 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11. 2011. pp. 1638-1641
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