A low-noise silicon nitride nanopore device on a polymer substrate

Wook Choi; Eun Seok Jeon; Kyoung Yong Chun; Young Rok Kim; Kyeong Beom Park; Ki Bum Kim; Chang-Soo Han

doi:10.1371/journal.pone.0200831

A low-noise silicon nitride nanopore device on a polymer substrate

Wook Choi, Eun Seok Jeon, Kyoung Yong Chun, Young Rok Kim, Kyeong Beom Park, Ki Bum Kim, Chang-Soo Han

Department of Mechanical Engineering

Research output: Contribution to journal › Article

1 Citation (Scopus)

Abstract

We report a novel low-noise nanopore device employing a polymer substrate. The Si substrate of a fabricated Si-substrate-based silicon nitride (Si₃N₄) membrane was replaced with a polymer substrate. As such, laser machining was used to make a micro-size hole through the polyimide (PI) substrate, and a thin Si₃N₄ membrane was then transferred onto the PI substrate. Finally, a nanopore was formed in the membrane using a transmission electron microscope for detection of biomolecules. Compared to the Si-substrate-based device, the dielectric noise was greatly reduced and the root-mean-square noise level was decreased from 146.7 to 5.4 pA. Using this device, the translocation of double-strand deoxyribonucleic acid (DNA) was detected with a high signal/noise (S/N) ratio. This type of device is anticipated to be available for future versatile sequencing technologies.

Original language	English
Article number	e0200831
Journal	PLoS One
Volume	13
Issue number	7
DOIs	https://doi.org/10.1371/journal.pone.0200831
Publication status	Published - 2018 Jul 1

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ASJC Scopus subject areas

Biochemistry, Genetics and Molecular Biology(all)
Agricultural and Biological Sciences(all)

Cite this

Choi, W., Jeon, E. S., Chun, K. Y., Kim, Y. R., Park, K. B., Kim, K. B., & Han, C-S. (2018). A low-noise silicon nitride nanopore device on a polymer substrate. PLoS One, 13(7), [e0200831]. https://doi.org/10.1371/journal.pone.0200831

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10.1371/journal.pone.0200831