A low-noise silicon nitride nanopore device on a polymer substrate

Wook Choi, Eun Seok Jeon, Kyoung Yong Chun, Young Rok Kim, Kyeong Beom Park, Ki Bum Kim, Chang-Soo Han

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Abstract

We report a novel low-noise nanopore device employing a polymer substrate. The Si substrate of a fabricated Si-substrate-based silicon nitride (Si3N4) membrane was replaced with a polymer substrate. As such, laser machining was used to make a micro-size hole through the polyimide (PI) substrate, and a thin Si3N4 membrane was then transferred onto the PI substrate. Finally, a nanopore was formed in the membrane using a transmission electron microscope for detection of biomolecules. Compared to the Si-substrate-based device, the dielectric noise was greatly reduced and the root-mean-square noise level was decreased from 146.7 to 5.4 pA. Using this device, the translocation of double-strand deoxyribonucleic acid (DNA) was detected with a high signal/noise (S/N) ratio. This type of device is anticipated to be available for future versatile sequencing technologies.

Original languageEnglish
Article numbere0200831
JournalPLoS One
Volume13
Issue number7
DOIs
Publication statusPublished - 2018 Jul 1

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ASJC Scopus subject areas

  • Biochemistry, Genetics and Molecular Biology(all)
  • Agricultural and Biological Sciences(all)

Cite this

Choi, W., Jeon, E. S., Chun, K. Y., Kim, Y. R., Park, K. B., Kim, K. B., & Han, C-S. (2018). A low-noise silicon nitride nanopore device on a polymer substrate. PLoS One, 13(7), [e0200831]. https://doi.org/10.1371/journal.pone.0200831