A new method for evaluating postacne scarring

Jin Woong Lee; Beom Joon Kim; Myeung Nam Kim; Young Hwan Choi; Kyungrok Kim; Eenjun Hwang

doi:10.1111/j.1600-0846.2011.00568.x

A new method for evaluating postacne scarring

Jin Woong Lee, Beom Joon Kim, Myeung Nam Kim, Young Hwan Choi, Kyungrok Kim, Eenjun Hwang

School of Electrical Engineering

Research output: Contribution to journal › Letter › peer-review

Original language	English
Pages (from-to)	384-385
Number of pages	2
Journal	Skin Research and Technology
Volume	18
Issue number	3
DOIs	https://doi.org/10.1111/j.1600-0846.2011.00568.x
Publication status	Published - 2012 Aug

ASJC Scopus subject areas

Dermatology

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10.1111/j.1600-0846.2011.00568.x

Cite this

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title = "A new method for evaluating postacne scarring",

author = "Lee, {Jin Woong} and Kim, {Beom Joon} and Kim, {Myeung Nam} and Choi, {Young Hwan} and Kyungrok Kim and Eenjun Hwang",

year = "2012",

month = aug,

doi = "10.1111/j.1600-0846.2011.00568.x",

language = "English",

volume = "18",

pages = "384--385",

journal = "Skin Research and Technology",

issn = "0909-752X",

publisher = "Wiley-Blackwell",

number = "3",

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TY - JOUR

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AU - Lee, Jin Woong

AU - Kim, Beom Joon

AU - Kim, Myeung Nam

AU - Choi, Young Hwan

AU - Kim, Kyungrok

AU - Hwang, Eenjun

PY - 2012/8

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M3 - Letter

C2 - 22092451

AN - SCOPUS:84863557345

SN - 0909-752X

VL - 18

SP - 384

EP - 385

JO - Skin Research and Technology

JF - Skin Research and Technology

IS - 3

ER -

A new method for evaluating postacne scarring

ASJC Scopus subject areas

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