A novel 5-mask etch-stopper pixel structure with a short channel oxide semiconductor TFT

Joon Young Yang; Sung Hoon Jung; Chang Seung Woo; Ju Yun Lee; Myungchul Jun; In Byeong Kang; Jung ho Park

A novel 5-mask etch-stopper pixel structure with a short channel oxide semiconductor TFT

Joon Young Yang, Sung Hoon Jung, Chang Seung Woo, Ju Yun Lee, Myungchul Jun, In Byeong Kang, Jung ho Park

School of Electrical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

3 Citations (Scopus)

Abstract

In order to solve the main issues of etch-stopper (ES) pixel structure (mask steps, parasitic capacitance C_gs, TFT channel length) in a-IGZO pixel structure of AMLED, new 5-mask ES a-IGZO pixel structure was investigated TFT channel length of 5 μm could be achieved by self aligned damage preventing layer. We could achieve good characteristics and reliability of short-channel-length (under 5 μm) ES TFTs. And also C_gs could be reduced more than 30%.

Original language	English
Title of host publication	Digest of Technical Papers - SID International Symposium
Publisher	Blackwell Publishing Ltd
Pages	304-307
Number of pages	4
Volume	46
Edition	Book 1
Publication status	Published - 2015 Jun 1
Event	2015 SID International Symposium - San Jose, United States Duration: 2015 Jun 2 → 2015 Jun 3

Other

Other	2015 SID International Symposium
Country/Territory	United States
City	San Jose
Period	15/6/2 → 15/6/3

ASJC Scopus subject areas

Engineering(all)

Cite this

@inproceedings{20bfc76b7c644620876465c8e2e5746c,

title = "A novel 5-mask etch-stopper pixel structure with a short channel oxide semiconductor TFT",

abstract = "In order to solve the main issues of etch-stopper (ES) pixel structure (mask steps, parasitic capacitance Cgs, TFT channel length) in a-IGZO pixel structure of AMLED, new 5-mask ES a-IGZO pixel structure was investigated TFT channel length of 5 μm could be achieved by self aligned damage preventing layer. We could achieve good characteristics and reliability of short-channel-length (under 5 μm) ES TFTs. And also Cgs could be reduced more than 30%.",

author = "Yang, {Joon Young} and Jung, {Sung Hoon} and Woo, {Chang Seung} and Lee, {Ju Yun} and Myungchul Jun and Kang, {In Byeong} and Park, {Jung ho}",

year = "2015",

month = jun,

day = "1",

language = "English",

volume = "46",

pages = "304--307",

booktitle = "Digest of Technical Papers - SID International Symposium",

publisher = "Blackwell Publishing Ltd",

edition = "Book 1",

note = "2015 SID International Symposium ; Conference date: 02-06-2015 Through 03-06-2015",

}

TY - GEN

T1 - A novel 5-mask etch-stopper pixel structure with a short channel oxide semiconductor TFT

AU - Yang, Joon Young

AU - Jung, Sung Hoon

AU - Woo, Chang Seung

AU - Lee, Ju Yun

AU - Jun, Myungchul

AU - Kang, In Byeong

AU - Park, Jung ho

PY - 2015/6/1

Y1 - 2015/6/1

N2 - In order to solve the main issues of etch-stopper (ES) pixel structure (mask steps, parasitic capacitance Cgs, TFT channel length) in a-IGZO pixel structure of AMLED, new 5-mask ES a-IGZO pixel structure was investigated TFT channel length of 5 μm could be achieved by self aligned damage preventing layer. We could achieve good characteristics and reliability of short-channel-length (under 5 μm) ES TFTs. And also Cgs could be reduced more than 30%.

AB - In order to solve the main issues of etch-stopper (ES) pixel structure (mask steps, parasitic capacitance Cgs, TFT channel length) in a-IGZO pixel structure of AMLED, new 5-mask ES a-IGZO pixel structure was investigated TFT channel length of 5 μm could be achieved by self aligned damage preventing layer. We could achieve good characteristics and reliability of short-channel-length (under 5 μm) ES TFTs. And also Cgs could be reduced more than 30%.

UR - http://www.scopus.com/inward/record.url?scp=84963706977&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84963706977&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:84963706977

VL - 46

SP - 304

EP - 307

BT - Digest of Technical Papers - SID International Symposium

PB - Blackwell Publishing Ltd

T2 - 2015 SID International Symposium

Y2 - 2 June 2015 through 3 June 2015

ER -

A novel 5-mask etch-stopper pixel structure with a short channel oxide semiconductor TFT

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ASJC Scopus subject areas

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