A printed nanobeam laser on a SiO2/Si substrate for low-threshold continuous-wave operation

Indra Karnadi, Jaehyeon Son, Ju Young Kim, Hoon Jang, Seungwoo Lee, Ki Soo Kim, Bumki Min, Yong Hee Lee

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

A small-footprint nanobeam photonic crystal laser made of InGaAsP material is directly integrated on a SiO2/Si substrate without using adhesive material via transfer-printing processes (i.e., dry transfer-printing). The transferred nanobeam structure with a physical volume of ∼6.6 × 0.58 × 0.28 μm3 (∼10.5 (λ/n)3) shows single mode lasing near 1550 nm with continuous-wave (CW) operation at room-temperature, where effective lasing threshold power was as low as 9 μW. This CW operation was achieved mainly due to efficient heat dissipation provided by direct contact between the nanobeam and the substrate. This transfer-printed nanobeam laser could be a promising candidate for the next-generation light source with a feature of low-power consumption in ultracompact photonic integrated circuits.

Original languageEnglish
Pages (from-to)12115-12121
Number of pages7
JournalOptics Express
Volume22
Issue number10
DOIs
Publication statusPublished - 2014

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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    Karnadi, I., Son, J., Kim, J. Y., Jang, H., Lee, S., Kim, K. S., Min, B., & Lee, Y. H. (2014). A printed nanobeam laser on a SiO2/Si substrate for low-threshold continuous-wave operation. Optics Express, 22(10), 12115-12121. https://doi.org/10.1364/OE.22.012115