A reduced model for nanoparticle coating in non-equilibrium plasma

B. Rovagnati, Alexander Yarin, F. Mashayek, T. Matsoukas

Research output: Contribution to journalArticle

Abstract

In this Letter, a reduced model is developed based on the full model presented earlier [Yarin et al., J. Appl. Phys. 99 (6) (2006) 064310] for the deposition of amorphous hydrogenated carbon onto particles in a methane-hydrogen plasma. The reduced model is developed based on the assumption that, under certain conditions, chemistry may be decoupled from transport. The results from the reduced model are compared to the results from the full model for particle charge and growth rate of the deposited layer. It is shown that the two models are in good agreement for submicron particles that are of interest in nanoparticle coating in low-pressure plasma reactors. The reduced model is computationally far less expensive as compared to the full model and can be implemented for simulation of a large number of nanoparticles in plasma reactors.

Original languageEnglish
Pages (from-to)1745-1748
Number of pages4
JournalPhysics Letters, Section A: General, Atomic and Solid State Physics
Volume377
Issue number28-30
DOIs
Publication statusPublished - 2013 Oct 15
Externally publishedYes

Fingerprint

nonequilibrium plasmas
coatings
nanoparticles
reactors
hydrogen plasma
methane
low pressure
chemistry
carbon

Keywords

  • Dusty plasma
  • Low-pressure plasma
  • Nanoparticle coating
  • Reduced model

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

A reduced model for nanoparticle coating in non-equilibrium plasma. / Rovagnati, B.; Yarin, Alexander; Mashayek, F.; Matsoukas, T.

In: Physics Letters, Section A: General, Atomic and Solid State Physics, Vol. 377, No. 28-30, 15.10.2013, p. 1745-1748.

Research output: Contribution to journalArticle

Rovagnati, B. ; Yarin, Alexander ; Mashayek, F. ; Matsoukas, T. / A reduced model for nanoparticle coating in non-equilibrium plasma. In: Physics Letters, Section A: General, Atomic and Solid State Physics. 2013 ; Vol. 377, No. 28-30. pp. 1745-1748.
@article{4ecb64cff30c4a17bd8aba79c6e4bef6,
title = "A reduced model for nanoparticle coating in non-equilibrium plasma",
abstract = "In this Letter, a reduced model is developed based on the full model presented earlier [Yarin et al., J. Appl. Phys. 99 (6) (2006) 064310] for the deposition of amorphous hydrogenated carbon onto particles in a methane-hydrogen plasma. The reduced model is developed based on the assumption that, under certain conditions, chemistry may be decoupled from transport. The results from the reduced model are compared to the results from the full model for particle charge and growth rate of the deposited layer. It is shown that the two models are in good agreement for submicron particles that are of interest in nanoparticle coating in low-pressure plasma reactors. The reduced model is computationally far less expensive as compared to the full model and can be implemented for simulation of a large number of nanoparticles in plasma reactors.",
keywords = "Dusty plasma, Low-pressure plasma, Nanoparticle coating, Reduced model",
author = "B. Rovagnati and Alexander Yarin and F. Mashayek and T. Matsoukas",
year = "2013",
month = "10",
day = "15",
doi = "10.1016/j.physleta.2013.05.010",
language = "English",
volume = "377",
pages = "1745--1748",
journal = "Physics Letters, Section A: General, Atomic and Solid State Physics",
issn = "0375-9601",
publisher = "Elsevier",
number = "28-30",

}

TY - JOUR

T1 - A reduced model for nanoparticle coating in non-equilibrium plasma

AU - Rovagnati, B.

AU - Yarin, Alexander

AU - Mashayek, F.

AU - Matsoukas, T.

PY - 2013/10/15

Y1 - 2013/10/15

N2 - In this Letter, a reduced model is developed based on the full model presented earlier [Yarin et al., J. Appl. Phys. 99 (6) (2006) 064310] for the deposition of amorphous hydrogenated carbon onto particles in a methane-hydrogen plasma. The reduced model is developed based on the assumption that, under certain conditions, chemistry may be decoupled from transport. The results from the reduced model are compared to the results from the full model for particle charge and growth rate of the deposited layer. It is shown that the two models are in good agreement for submicron particles that are of interest in nanoparticle coating in low-pressure plasma reactors. The reduced model is computationally far less expensive as compared to the full model and can be implemented for simulation of a large number of nanoparticles in plasma reactors.

AB - In this Letter, a reduced model is developed based on the full model presented earlier [Yarin et al., J. Appl. Phys. 99 (6) (2006) 064310] for the deposition of amorphous hydrogenated carbon onto particles in a methane-hydrogen plasma. The reduced model is developed based on the assumption that, under certain conditions, chemistry may be decoupled from transport. The results from the reduced model are compared to the results from the full model for particle charge and growth rate of the deposited layer. It is shown that the two models are in good agreement for submicron particles that are of interest in nanoparticle coating in low-pressure plasma reactors. The reduced model is computationally far less expensive as compared to the full model and can be implemented for simulation of a large number of nanoparticles in plasma reactors.

KW - Dusty plasma

KW - Low-pressure plasma

KW - Nanoparticle coating

KW - Reduced model

UR - http://www.scopus.com/inward/record.url?scp=84878012533&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84878012533&partnerID=8YFLogxK

U2 - 10.1016/j.physleta.2013.05.010

DO - 10.1016/j.physleta.2013.05.010

M3 - Article

AN - SCOPUS:84878012533

VL - 377

SP - 1745

EP - 1748

JO - Physics Letters, Section A: General, Atomic and Solid State Physics

JF - Physics Letters, Section A: General, Atomic and Solid State Physics

SN - 0375-9601

IS - 28-30

ER -