A study of stress-induced p+/n salicided junction leakage failure and optimized process conditions for sub-0.15-μm CMOS technology

Joo Hyoung Lee, Sung Hyung Park, Key Min Lee, Ki Seok Youn, Young Jin Park, Chel Jong Choi, Tae Yeon Seong, Hi Deok Lee

Research output: Contribution to journalArticlepeer-review

22 Citations (Scopus)

Abstract

We have clarified that mechanical stress combined with shallower junction at the active edge is the main cause of junction leakage current failure of shallow p+/n salicided junctions for sub-0.15-μm CMOS technology, especially those with narrow active width. Mechanical stress results in the penetration of a Self-Aligned siLICIDE (SALICIDE) layer at the corner region of narrow active line. Moreover, a novel electrochemical etching with TEM shows shallower junctions at the active edge due to the bending up of the junction profile. We found that the application of a shallow trench isolation (STI), top corner rounding (TCR) process suppresses the mechanical stress of STI's top corner and thus eliminates the stress-induced p+/n salicided junction leakage failure. Furthermore, we optimized the Co SALICIDE process using a Ge+ pre-amorphization in narrow p+/n salicided junction.

Original languageEnglish
Pages (from-to)1985-1992
Number of pages8
JournalIEEE Transactions on Electron Devices
Volume49
Issue number11
DOIs
Publication statusPublished - 2002 Nov
Externally publishedYes

Keywords

  • 2-D junction profile
  • Atomic force microscopy (AFM)
  • Ge pre-amorphization implant (PAI)
  • P/n salicided junction
  • SALICIDE penetration
  • Stress-induced leakage failure
  • Top corner rounding (TCR)

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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