A study of stress-induced p+/n salicided junction leakage failure and optimized process conditions for sub-0.15-μm CMOS technology

Joo Hyoung Lee, Sung Hyung Park, Key Min Lee, Ki Seok Youn, Young Jin Park, Chel Jong Choi, Tae Yeon Seong, Hi Deok Lee

Research output: Contribution to journalArticlepeer-review

23 Citations (Scopus)

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Chemical Compounds

Engineering & Materials Science