A study on the aluminum fire-through to a-SiNx:H thin film for crystalline solar cells

Jooyong Song, Sungeun Park, Soonwoo Kwon, Sungtak Kim, Hyunho Kim, Sung Ju Tark, Sewang Yoon, Donghwan Kim

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


The relationship between aluminum fire-through and the properties of a-SiNx:H thin films was investigated to aid their use as dielectric layers in rear side and front passivation layers in crystalline solar cells. Aluminum fire-through was shown to depend on the refractive index and the deposition rate of the films. Refractive index, density and deposition rate increased with increasing SiH4/NH3 ratio, while the etching rate decreased. Aluminum fire-through occurred in a sample of refractive index 2.0 during fast deposition but not when the deposition rate was slow. Aluminum fire-through occurred during extended firing, despite it not occurring during normal firing by RTP. The results of this work demonstrate that refractive index was the major determinant of aluminum fire-through, and that the aluminum and the a-SiNx:H thin film reacted immediately at the beginning of firing at a rate determined by the deposition rate.

Original languageEnglish
Pages (from-to)313-318
Number of pages6
JournalCurrent Applied Physics
Issue number1
Publication statusPublished - 2012 Jan


  • Aluminum
  • Back surface field
  • Local contact
  • Rear passivation
  • Silicon nitride
  • Solar cell

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy(all)


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