Activated calcium silicate thinfilm by He plasma treatments

Inho Han, Hong Koo Baik, Sang-Wan Shin, In Seop Lee

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Calcium phosphate forming ability of thin calcium silicates film formed by electron-beam evaporation has been reported. Increasing calcium concentration in calcium silicates is necessary to provide high bioactivity, but there is limitation due to mechanical strength. In this paper, plasma treatment was proposed as post-treatment process for calcium silicate thinfilm to acquire high bioactivity. Thinfilm of calcium silicate was synthesized on titanium coated silicon wafer by means of electron-beam evaporation, and then annealed at 400 °C in air prior to helium atmospheric pressure dielectric barrier discharge (He-AP-DBD) treatment. He-AP-DBD treatment introduced hydrophilic surface with hydroxyl functional group on calcium silicate surface, and calcium phosphate formation was accelerated in phosphate buffered saline (PBS) containing CaCl2.

Original languageEnglish
Pages (from-to)5746-5749
Number of pages4
JournalSurface and Coatings Technology
Volume202
Issue number22-23
DOIs
Publication statusPublished - 2008 Aug 30

Fingerprint

calcium silicates
Calcium silicate
Plasmas
Helium
calcium phosphates
Calcium phosphate
Bioactivity
Atmospheric pressure
Electron beams
atmospheric pressure
Evaporation
helium
evaporation
electron beams
Titanium
Silicon wafers
Discharge (fluid mechanics)
Hydroxyl Radical
Functional groups
Strength of materials

Keywords

  • Bioglass
  • Calcium silicate
  • DBD
  • e-beam evaporation
  • Plasma treatment

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Activated calcium silicate thinfilm by He plasma treatments. / Han, Inho; Baik, Hong Koo; Shin, Sang-Wan; Lee, In Seop.

In: Surface and Coatings Technology, Vol. 202, No. 22-23, 30.08.2008, p. 5746-5749.

Research output: Contribution to journalArticle

Han, Inho ; Baik, Hong Koo ; Shin, Sang-Wan ; Lee, In Seop. / Activated calcium silicate thinfilm by He plasma treatments. In: Surface and Coatings Technology. 2008 ; Vol. 202, No. 22-23. pp. 5746-5749.
@article{3b1f8f2ac1e34716aebce90c675f98f6,
title = "Activated calcium silicate thinfilm by He plasma treatments",
abstract = "Calcium phosphate forming ability of thin calcium silicates film formed by electron-beam evaporation has been reported. Increasing calcium concentration in calcium silicates is necessary to provide high bioactivity, but there is limitation due to mechanical strength. In this paper, plasma treatment was proposed as post-treatment process for calcium silicate thinfilm to acquire high bioactivity. Thinfilm of calcium silicate was synthesized on titanium coated silicon wafer by means of electron-beam evaporation, and then annealed at 400 °C in air prior to helium atmospheric pressure dielectric barrier discharge (He-AP-DBD) treatment. He-AP-DBD treatment introduced hydrophilic surface with hydroxyl functional group on calcium silicate surface, and calcium phosphate formation was accelerated in phosphate buffered saline (PBS) containing CaCl2.",
keywords = "Bioglass, Calcium silicate, DBD, e-beam evaporation, Plasma treatment",
author = "Inho Han and Baik, {Hong Koo} and Sang-Wan Shin and Lee, {In Seop}",
year = "2008",
month = "8",
day = "30",
doi = "10.1016/j.surfcoat.2008.06.081",
language = "English",
volume = "202",
pages = "5746--5749",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",
number = "22-23",

}

TY - JOUR

T1 - Activated calcium silicate thinfilm by He plasma treatments

AU - Han, Inho

AU - Baik, Hong Koo

AU - Shin, Sang-Wan

AU - Lee, In Seop

PY - 2008/8/30

Y1 - 2008/8/30

N2 - Calcium phosphate forming ability of thin calcium silicates film formed by electron-beam evaporation has been reported. Increasing calcium concentration in calcium silicates is necessary to provide high bioactivity, but there is limitation due to mechanical strength. In this paper, plasma treatment was proposed as post-treatment process for calcium silicate thinfilm to acquire high bioactivity. Thinfilm of calcium silicate was synthesized on titanium coated silicon wafer by means of electron-beam evaporation, and then annealed at 400 °C in air prior to helium atmospheric pressure dielectric barrier discharge (He-AP-DBD) treatment. He-AP-DBD treatment introduced hydrophilic surface with hydroxyl functional group on calcium silicate surface, and calcium phosphate formation was accelerated in phosphate buffered saline (PBS) containing CaCl2.

AB - Calcium phosphate forming ability of thin calcium silicates film formed by electron-beam evaporation has been reported. Increasing calcium concentration in calcium silicates is necessary to provide high bioactivity, but there is limitation due to mechanical strength. In this paper, plasma treatment was proposed as post-treatment process for calcium silicate thinfilm to acquire high bioactivity. Thinfilm of calcium silicate was synthesized on titanium coated silicon wafer by means of electron-beam evaporation, and then annealed at 400 °C in air prior to helium atmospheric pressure dielectric barrier discharge (He-AP-DBD) treatment. He-AP-DBD treatment introduced hydrophilic surface with hydroxyl functional group on calcium silicate surface, and calcium phosphate formation was accelerated in phosphate buffered saline (PBS) containing CaCl2.

KW - Bioglass

KW - Calcium silicate

KW - DBD

KW - e-beam evaporation

KW - Plasma treatment

UR - http://www.scopus.com/inward/record.url?scp=50349094461&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=50349094461&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2008.06.081

DO - 10.1016/j.surfcoat.2008.06.081

M3 - Article

VL - 202

SP - 5746

EP - 5749

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - 22-23

ER -