Adsorption and growth of Xe adlayers on the Cu(111) surface

Ji Yong Park, S. J. Kahng, U. D. Ham, Y. Kuk, M. Miyake, K. Hata, H. Shigekawa

Research output: Contribution to journalArticle

35 Citations (Scopus)

Abstract

The adsorption and growth of Xe layers on the Cu(111) surface were studied with a low-temperature scanning tunneling microscope. Initially, Xe atoms preferentially adsorb at the step, revealing two different wetting behaviors at the upper and the lower step edges at the coverage of <0.1 monolayer. Three-dimensional island growth is followed on the terrace at the coverage of >0.2 monolayer when grown at <20 K. The island growth is attributed to inhomogeneous nucleation and lower diffusivity of Xe on the Xe monolayer than on the Cu(111) surface. The diffusion barriers, the two-dimensional barrier on a terrace and the one-dimensional barrier along a step, and the step-down barrier determine the growth morphology of Xe layers as the substrate temperature was raised.

Original languageEnglish
Pages (from-to)16934-16940
Number of pages7
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume60
Issue number24
DOIs
Publication statusPublished - 1999
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Fingerprint Dive into the research topics of 'Adsorption and growth of Xe adlayers on the Cu(111) surface'. Together they form a unique fingerprint.

  • Cite this