Advanced semiconductor fabrication process control using dual filter exponentially weighted moving average

Hyo Heon Ko, Jihyun Kim, Sang Hoon Park, Jun-Geol Baek, Sung Shick Kim

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Semiconductor industry needs to meet high standards to ensure survival and success in the 21st century. Rising expectations from the customers are demanding the semiconductor industry to manufacture products with both accuracy and precision. To comply with the strict demands, an effective control method for semiconductor manufacturing is introduced. The process environment is afflicted by process disturbances. Different characteristics of the process disturbances require the controlmethod to be able to respond accordingly. This study utilizes two separate exponentially weighted moving average (EWMA) filters simultaneously to improve the performance of the control method. By utilizing dual filters, the influence of the white noise is reduced and the accurate process control is made possible. The proposed methodology is evaluated through simulation in comparison with two other control methods.

Original languageEnglish
Pages (from-to)443-455
Number of pages13
JournalJournal of Intelligent Manufacturing
Volume23
Issue number3
DOIs
Publication statusPublished - 2012 Jun 1

Fingerprint

Process control
Semiconductor materials
Fabrication
White noise
Industry

Keywords

  • Dual filter EWMA
  • EWMA
  • Process control
  • Run-to-run
  • Semiconductor fabrication process

ASJC Scopus subject areas

  • Artificial Intelligence
  • Software
  • Industrial and Manufacturing Engineering

Cite this

Advanced semiconductor fabrication process control using dual filter exponentially weighted moving average. / Ko, Hyo Heon; Kim, Jihyun; Park, Sang Hoon; Baek, Jun-Geol; Kim, Sung Shick.

In: Journal of Intelligent Manufacturing, Vol. 23, No. 3, 01.06.2012, p. 443-455.

Research output: Contribution to journalArticle

Ko, Hyo Heon ; Kim, Jihyun ; Park, Sang Hoon ; Baek, Jun-Geol ; Kim, Sung Shick. / Advanced semiconductor fabrication process control using dual filter exponentially weighted moving average. In: Journal of Intelligent Manufacturing. 2012 ; Vol. 23, No. 3. pp. 443-455.
@article{2c8567dc68d84d95bd1411053acd94e5,
title = "Advanced semiconductor fabrication process control using dual filter exponentially weighted moving average",
abstract = "Semiconductor industry needs to meet high standards to ensure survival and success in the 21st century. Rising expectations from the customers are demanding the semiconductor industry to manufacture products with both accuracy and precision. To comply with the strict demands, an effective control method for semiconductor manufacturing is introduced. The process environment is afflicted by process disturbances. Different characteristics of the process disturbances require the controlmethod to be able to respond accordingly. This study utilizes two separate exponentially weighted moving average (EWMA) filters simultaneously to improve the performance of the control method. By utilizing dual filters, the influence of the white noise is reduced and the accurate process control is made possible. The proposed methodology is evaluated through simulation in comparison with two other control methods.",
keywords = "Dual filter EWMA, EWMA, Process control, Run-to-run, Semiconductor fabrication process",
author = "Ko, {Hyo Heon} and Jihyun Kim and Park, {Sang Hoon} and Jun-Geol Baek and Kim, {Sung Shick}",
year = "2012",
month = "6",
day = "1",
doi = "10.1007/s10845-010-0383-6",
language = "English",
volume = "23",
pages = "443--455",
journal = "Journal of Intelligent Manufacturing",
issn = "0956-5515",
publisher = "Springer Netherlands",
number = "3",

}

TY - JOUR

T1 - Advanced semiconductor fabrication process control using dual filter exponentially weighted moving average

AU - Ko, Hyo Heon

AU - Kim, Jihyun

AU - Park, Sang Hoon

AU - Baek, Jun-Geol

AU - Kim, Sung Shick

PY - 2012/6/1

Y1 - 2012/6/1

N2 - Semiconductor industry needs to meet high standards to ensure survival and success in the 21st century. Rising expectations from the customers are demanding the semiconductor industry to manufacture products with both accuracy and precision. To comply with the strict demands, an effective control method for semiconductor manufacturing is introduced. The process environment is afflicted by process disturbances. Different characteristics of the process disturbances require the controlmethod to be able to respond accordingly. This study utilizes two separate exponentially weighted moving average (EWMA) filters simultaneously to improve the performance of the control method. By utilizing dual filters, the influence of the white noise is reduced and the accurate process control is made possible. The proposed methodology is evaluated through simulation in comparison with two other control methods.

AB - Semiconductor industry needs to meet high standards to ensure survival and success in the 21st century. Rising expectations from the customers are demanding the semiconductor industry to manufacture products with both accuracy and precision. To comply with the strict demands, an effective control method for semiconductor manufacturing is introduced. The process environment is afflicted by process disturbances. Different characteristics of the process disturbances require the controlmethod to be able to respond accordingly. This study utilizes two separate exponentially weighted moving average (EWMA) filters simultaneously to improve the performance of the control method. By utilizing dual filters, the influence of the white noise is reduced and the accurate process control is made possible. The proposed methodology is evaluated through simulation in comparison with two other control methods.

KW - Dual filter EWMA

KW - EWMA

KW - Process control

KW - Run-to-run

KW - Semiconductor fabrication process

UR - http://www.scopus.com/inward/record.url?scp=84862302827&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84862302827&partnerID=8YFLogxK

U2 - 10.1007/s10845-010-0383-6

DO - 10.1007/s10845-010-0383-6

M3 - Article

AN - SCOPUS:84862302827

VL - 23

SP - 443

EP - 455

JO - Journal of Intelligent Manufacturing

JF - Journal of Intelligent Manufacturing

SN - 0956-5515

IS - 3

ER -