Ag clusters on ultra-thin, ordered SiO2 films

A. K. Santra, B. K. Min, D. W. Goodman

Research output: Contribution to journalArticle

28 Citations (Scopus)

Abstract

Scanning tunneling microscopy (STM) and low energy electron diffraction have been used to optimize the key synthetic parameters for the preparation of oriented, SiO2 films on Mo(1 1 2). Extremely flat, ultra-thin, single-crystalline SiO2 films have been prepared via deposition of silicon, its subsequent oxidation, followed by an anneal. Highly resolved STM images have been obtained for the first time on these films. At room temperature, Ag clusters grow two-dimensionally on these oriented films with a preferred orientation and sinter with a bimodal size distribution upon exposure to elevated pressures (160 mb and 60 min) of oxygen. Annealing the as-deposited Ag clusters at elevated temperatures (600 K) in ultra-high vacuum also leads to sintering.

Original languageEnglish
Pages (from-to)L475-L479
JournalSurface Science
Volume515
Issue number1
DOIs
Publication statusPublished - 2002 Aug

Keywords

  • Epitaxy
  • Molybdenum
  • Scanning tunneling microscopy
  • Silicon oxides
  • Silver
  • Sintering

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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    Santra, A. K., Min, B. K., & Goodman, D. W. (2002). Ag clusters on ultra-thin, ordered SiO2 films. Surface Science, 515(1), L475-L479. https://doi.org/10.1016/S0039-6028(02)01952-0