Al2O3 coating of ZnO nanorods by atomic layer deposition

B. Min, J. S. Lee, J. W. Hwang, K. H. Keem, M. I. Kang, K. Cho, M. Y. Sung, S. Kim, M. S. Lee, S. O. Park, J. T. Moon

Research output: Contribution to journalArticlepeer-review

53 Citations (Scopus)

Abstract

ZnO nanorods were coated conformally with aluminum oxide (Al2O3) material by atomic layer deposition (ALD). The ZnO nanorods were first synthesized on a Si(1 0 0) substrate from ball-milled ZnO powders by a thermal evaporation procedure. Al2O3 films were then deposited on these ZnO nanorods by ALD at a substrate temperature of 300°C using trimethylaluminum and distilled water. Transmission electron microscopy (TEM) and high-resolution transmission electron microscopy (HRTEM) images of the deposited ZnO nanorods revealed that amorphous Al2O3 cylindrical shells surround the ZnO nanorods. These TEM images illustrate that ALD has an excellent capability to coat any shape of nanorods conformally.

Original languageEnglish
Pages (from-to)565-569
Number of pages5
JournalJournal of Crystal Growth
Volume252
Issue number4
DOIs
Publication statusPublished - 2003 May

Keywords

  • A1. Coating
  • A1. Transmission electron microscopy
  • A2. Atomic layer deposition
  • B1. AlO
  • B1. ZnO nanorods

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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