Aluminum-induced crystallization of amorphous germanium on glass synthesized by combination of PIII&D and HiPIMS process

Jun Hong Jeon, Jin Young Choi, Won Woong Park, Sun Woo Moon, Sang Ho Lim, Seung Hee Han

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

A new plasma process, i.e., combination of PIII&D(Plasma Immersion Ion Implantation and Deposition) and HiPIMS(HIgh Power Impulse Magnetron Sputtering), was developed to implant non-gaseous ions into materials surface. The new process has great advantage that thin film deposition and non-gaseous ion implantation can be achieved in a single plasma chamber. In this process, Al ions were successfully implanted into glass, and Ge thin films of ∼100 nm thickness were deposited on to Al-implanted glass by HiPIMS process. After annealing at ∼400 °C, crystallized Ge thin film could be attained with very low residual Al content.

Original languageEnglish
Title of host publication2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011
Pages547-548
Number of pages2
DOIs
Publication statusPublished - 2011
Event2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011 - Jeju, Korea, Republic of
Duration: 2011 Oct 182011 Oct 21

Publication series

Name2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011

Other

Other2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011
CountryKorea, Republic of
CityJeju
Period11/10/1811/10/21

ASJC Scopus subject areas

  • Materials Science(all)

Fingerprint Dive into the research topics of 'Aluminum-induced crystallization of amorphous germanium on glass synthesized by combination of PIII&D and HiPIMS process'. Together they form a unique fingerprint.

  • Cite this

    Jeon, J. H., Choi, J. Y., Park, W. W., Moon, S. W., Lim, S. H., & Han, S. H. (2011). Aluminum-induced crystallization of amorphous germanium on glass synthesized by combination of PIII&D and HiPIMS process. In 2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011 (pp. 547-548). [6155290] (2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011). https://doi.org/10.1109/NMDC.2011.6155290