An effective way to suppress the pyrochlore phase formation in SBT thin films

Se Yeon Jung, Woo Chul Kwak, Seung Joon Hwang, Yun Mo Sung

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Sr 0.7Bi 2.4Ta 2O 9 (SBT) thin films were deposited on Pt/Ti/SiO 2/Si substrates with and without a seed layer of ∼40 nm thickness using sol-gel and spin coating methods. The influence of seed layer on the phase formation characteristics of SBT thin films was investigated using x-ray diffraction (XRD) and scanning electron microscopy (SEM) analyses. Formation of pyrochlore as well as Aurivillius phase was observed in both the unseeded and seeded SBT films heated at 740°C. However, it was revealed that Aurivillius phase formation was enhanced in seeded SBT thin films and pyrochlore phase formation was highly suppressed. In this study, two possible mechanisms for the suppression of pyrochlore phase formation were proposed from the perspectives of activation energy difference for Aurivillius and pyrochlore phase formation and Bi-ion diffusion to pyrochlore phase.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
EditorsS. Hoffmann-Eifert, H. Funakubo, V. Joshi, A.I. Kingon, I.P. Koutsaroff
Pages243-248
Number of pages6
Volume784
Publication statusPublished - 2003
Externally publishedYes
EventFerroelectric Thin Films XII - Boston, MA, United States
Duration: 2003 Dec 12003 Dec 4

Other

OtherFerroelectric Thin Films XII
CountryUnited States
CityBoston, MA
Period03/12/103/12/4

    Fingerprint

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Jung, S. Y., Kwak, W. C., Hwang, S. J., & Sung, Y. M. (2003). An effective way to suppress the pyrochlore phase formation in SBT thin films. In S. Hoffmann-Eifert, H. Funakubo, V. Joshi, A. I. Kingon, & I. P. Koutsaroff (Eds.), Materials Research Society Symposium - Proceedings (Vol. 784, pp. 243-248)