Abstract
The secondary growth methodology to form zeolite membranes has stringent requirements for homogeneous epitaxial intergrowth of the seed layer and limits the number of accessible high-quality zeolite membranes. Despite previous reports on hetero-epitaxial growth, high-performance zeolite membranes have yet to be reported using this approach. Here, the successful hetero-epitaxial growth of highly siliceous ZSM-58 (DDR-type zeolite) films from a SSZ-13 (CHA-type zeolite) seed layer is reported. The resulting membranes show excellent CO2 perm-selectivities, having maximum CO2 /N2 and CO2 /CH4 separation factors (SFs) as high as about 17 and 279, respectively, at 30 °C. Furthermore, the hybrid membrane maintains the CO2 perm-selectivity in the presence of water vapor (the third main component in both cases), that is, CO2 /N2 SF of about 14 and CO2 /CH4 SF of about 78, respectively, at 50 °C (a representative temperature of both CO2-containing streams).
| Original language | English |
|---|---|
| Pages (from-to) | 18654-18662 |
| Number of pages | 9 |
| Journal | Angewandte Chemie - International Edition |
| Volume | 58 |
| Issue number | 51 |
| DOIs | |
| Publication status | Published - 2019 Dec 16 |
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Keywords
- carbon dioxide
- electron microscopy
- membranes
- separations
- zeolites
ASJC Scopus subject areas
- Catalysis
- Chemistry(all)
Cite this
An Hetero-Epitaxially Grown Zeolite Membrane. / Jeong, Yanghwan; Hong, Sungwon; Jang, Eunhee; Kim, Eunjoo; Baik, Hionsuck; Choi, Nakwon; Yip, Alex C.K.; Choi, Jungkyu.
In: Angewandte Chemie - International Edition, Vol. 58, No. 51, 16.12.2019, p. 18654-18662.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - An Hetero-Epitaxially Grown Zeolite Membrane
AU - Jeong, Yanghwan
AU - Hong, Sungwon
AU - Jang, Eunhee
AU - Kim, Eunjoo
AU - Baik, Hionsuck
AU - Choi, Nakwon
AU - Yip, Alex C.K.
AU - Choi, Jungkyu
PY - 2019/12/16
Y1 - 2019/12/16
N2 - The secondary growth methodology to form zeolite membranes has stringent requirements for homogeneous epitaxial intergrowth of the seed layer and limits the number of accessible high-quality zeolite membranes. Despite previous reports on hetero-epitaxial growth, high-performance zeolite membranes have yet to be reported using this approach. Here, the successful hetero-epitaxial growth of highly siliceous ZSM-58 (DDR-type zeolite) films from a SSZ-13 (CHA-type zeolite) seed layer is reported. The resulting membranes show excellent CO2 perm-selectivities, having maximum CO2 /N2 and CO2 /CH4 separation factors (SFs) as high as about 17 and 279, respectively, at 30 °C. Furthermore, the hybrid membrane maintains the CO2 perm-selectivity in the presence of water vapor (the third main component in both cases), that is, CO2 /N2 SF of about 14 and CO2 /CH4 SF of about 78, respectively, at 50 °C (a representative temperature of both CO2-containing streams).
AB - The secondary growth methodology to form zeolite membranes has stringent requirements for homogeneous epitaxial intergrowth of the seed layer and limits the number of accessible high-quality zeolite membranes. Despite previous reports on hetero-epitaxial growth, high-performance zeolite membranes have yet to be reported using this approach. Here, the successful hetero-epitaxial growth of highly siliceous ZSM-58 (DDR-type zeolite) films from a SSZ-13 (CHA-type zeolite) seed layer is reported. The resulting membranes show excellent CO2 perm-selectivities, having maximum CO2 /N2 and CO2 /CH4 separation factors (SFs) as high as about 17 and 279, respectively, at 30 °C. Furthermore, the hybrid membrane maintains the CO2 perm-selectivity in the presence of water vapor (the third main component in both cases), that is, CO2 /N2 SF of about 14 and CO2 /CH4 SF of about 78, respectively, at 50 °C (a representative temperature of both CO2-containing streams).
KW - carbon dioxide
KW - electron microscopy
KW - membranes
KW - separations
KW - zeolites
UR - http://www.scopus.com/inward/record.url?scp=85074867816&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85074867816&partnerID=8YFLogxK
U2 - 10.1002/anie.201911164
DO - 10.1002/anie.201911164
M3 - Article
C2 - 31591796
AN - SCOPUS:85074867816
VL - 58
SP - 18654
EP - 18662
JO - Angewandte Chemie - International Edition
JF - Angewandte Chemie - International Edition
SN - 1433-7851
IS - 51
ER -