An Hetero-Epitaxially Grown Zeolite Membrane

Yanghwan Jeong; Sungwon Hong; Eunhee Jang; Eunjoo Kim; Hionsuck Baik; Nakwon Choi; Alex C.K. Yip; Jungkyu Choi

doi:10.1002/anie.201911164

An Hetero-Epitaxially Grown Zeolite Membrane

Yanghwan Jeong, Sungwon Hong, Eunhee Jang, Eunjoo Kim, Hionsuck Baik, Nakwon Choi, Alex C.K. Yip, Jungkyu Choi

Department of Chemical and Biological Engineering

Research output: Contribution to journal › Article › peer-review

22 Citations (Scopus)

Abstract

The secondary growth methodology to form zeolite membranes has stringent requirements for homogeneous epitaxial intergrowth of the seed layer and limits the number of accessible high-quality zeolite membranes. Despite previous reports on hetero-epitaxial growth, high-performance zeolite membranes have yet to be reported using this approach. Here, the successful hetero-epitaxial growth of highly siliceous ZSM-58 (DDR-type zeolite) films from a SSZ-13 (CHA-type zeolite) seed layer is reported. The resulting membranes show excellent CO₂ perm-selectivities, having maximum CO₂ /N₂ and CO₂ /CH₄ separation factors (SFs) as high as about 17 and 279, respectively, at 30 °C. Furthermore, the hybrid membrane maintains the CO₂ perm-selectivity in the presence of water vapor (the third main component in both cases), that is, CO₂ /N₂ SF of about 14 and CO₂ /CH₄ SF of about 78, respectively, at 50 °C (a representative temperature of both CO₂-containing streams).

Original language	English
Pages (from-to)	18654-18662
Number of pages	9
Journal	Angewandte Chemie - International Edition
Volume	58
Issue number	51
DOIs	https://doi.org/10.1002/anie.201911164
Publication status	Published - 2019 Dec 16

Keywords

carbon dioxide
electron microscopy
membranes
separations
zeolites

ASJC Scopus subject areas

Catalysis
Chemistry(all)

Access to Document

10.1002/anie.201911164

Cite this

@article{056d28bbe3604446985b95da8f54b170,

title = "An Hetero-Epitaxially Grown Zeolite Membrane",

abstract = "The secondary growth methodology to form zeolite membranes has stringent requirements for homogeneous epitaxial intergrowth of the seed layer and limits the number of accessible high-quality zeolite membranes. Despite previous reports on hetero-epitaxial growth, high-performance zeolite membranes have yet to be reported using this approach. Here, the successful hetero-epitaxial growth of highly siliceous ZSM-58 (DDR-type zeolite) films from a SSZ-13 (CHA-type zeolite) seed layer is reported. The resulting membranes show excellent CO2 perm-selectivities, having maximum CO2 /N2 and CO2 /CH4 separation factors (SFs) as high as about 17 and 279, respectively, at 30 °C. Furthermore, the hybrid membrane maintains the CO2 perm-selectivity in the presence of water vapor (the third main component in both cases), that is, CO2 /N2 SF of about 14 and CO2 /CH4 SF of about 78, respectively, at 50 °C (a representative temperature of both CO2-containing streams).",

keywords = "carbon dioxide, electron microscopy, membranes, separations, zeolites",

author = "Yanghwan Jeong and Sungwon Hong and Eunhee Jang and Eunjoo Kim and Hionsuck Baik and Nakwon Choi and Yip, {Alex C.K.} and Jungkyu Choi",

note = "Funding Information: This work was financially supported by the Korea CCS R&D Center (KCRC) (2014M1A8A1049309), the International Research & Development Program (2016K1A3A1A48954031), and the Super Ultra Low Energy and Emission Vehicle (SULEEV) Center (2016R1A5A1009592) through the National Research Foundation (NRF) of Korea. These three grants were funded by the Korea government (Ministry of Science and ICT). This research was also supported by the Korea University Future Research Grant. SEM and XRD characterizations were conducted at the Korea University Engineering Laboratory Center, while TEM and partial SEM characterizations were carried out at the Korea Basic Science Institute (KBSI). FCOM images were obtained at the Korea Institute of Science and Technology (KIST). CO2/N2 and CO2/CH4 permeation measurements were carried out in the Choi group at Korea University. Publisher Copyright: {\textcopyright} 2019 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim",

year = "2019",

month = dec,

day = "16",

doi = "10.1002/anie.201911164",

language = "English",

volume = "58",

pages = "18654--18662",

journal = "Angewandte Chemie - International Edition",

issn = "1433-7851",

publisher = "John Wiley and Sons Ltd",

number = "51",

}

TY - JOUR

T1 - An Hetero-Epitaxially Grown Zeolite Membrane

AU - Jeong, Yanghwan

AU - Hong, Sungwon

AU - Jang, Eunhee

AU - Kim, Eunjoo

AU - Baik, Hionsuck

AU - Choi, Nakwon

AU - Yip, Alex C.K.

AU - Choi, Jungkyu

N1 - Funding Information: This work was financially supported by the Korea CCS R&D Center (KCRC) (2014M1A8A1049309), the International Research & Development Program (2016K1A3A1A48954031), and the Super Ultra Low Energy and Emission Vehicle (SULEEV) Center (2016R1A5A1009592) through the National Research Foundation (NRF) of Korea. These three grants were funded by the Korea government (Ministry of Science and ICT). This research was also supported by the Korea University Future Research Grant. SEM and XRD characterizations were conducted at the Korea University Engineering Laboratory Center, while TEM and partial SEM characterizations were carried out at the Korea Basic Science Institute (KBSI). FCOM images were obtained at the Korea Institute of Science and Technology (KIST). CO2/N2 and CO2/CH4 permeation measurements were carried out in the Choi group at Korea University. Publisher Copyright: © 2019 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim

PY - 2019/12/16

Y1 - 2019/12/16

N2 - The secondary growth methodology to form zeolite membranes has stringent requirements for homogeneous epitaxial intergrowth of the seed layer and limits the number of accessible high-quality zeolite membranes. Despite previous reports on hetero-epitaxial growth, high-performance zeolite membranes have yet to be reported using this approach. Here, the successful hetero-epitaxial growth of highly siliceous ZSM-58 (DDR-type zeolite) films from a SSZ-13 (CHA-type zeolite) seed layer is reported. The resulting membranes show excellent CO2 perm-selectivities, having maximum CO2 /N2 and CO2 /CH4 separation factors (SFs) as high as about 17 and 279, respectively, at 30 °C. Furthermore, the hybrid membrane maintains the CO2 perm-selectivity in the presence of water vapor (the third main component in both cases), that is, CO2 /N2 SF of about 14 and CO2 /CH4 SF of about 78, respectively, at 50 °C (a representative temperature of both CO2-containing streams).

AB - The secondary growth methodology to form zeolite membranes has stringent requirements for homogeneous epitaxial intergrowth of the seed layer and limits the number of accessible high-quality zeolite membranes. Despite previous reports on hetero-epitaxial growth, high-performance zeolite membranes have yet to be reported using this approach. Here, the successful hetero-epitaxial growth of highly siliceous ZSM-58 (DDR-type zeolite) films from a SSZ-13 (CHA-type zeolite) seed layer is reported. The resulting membranes show excellent CO2 perm-selectivities, having maximum CO2 /N2 and CO2 /CH4 separation factors (SFs) as high as about 17 and 279, respectively, at 30 °C. Furthermore, the hybrid membrane maintains the CO2 perm-selectivity in the presence of water vapor (the third main component in both cases), that is, CO2 /N2 SF of about 14 and CO2 /CH4 SF of about 78, respectively, at 50 °C (a representative temperature of both CO2-containing streams).

KW - carbon dioxide

KW - electron microscopy

KW - membranes

KW - separations

KW - zeolites

UR - http://www.scopus.com/inward/record.url?scp=85074867816&partnerID=8YFLogxK

U2 - 10.1002/anie.201911164

DO - 10.1002/anie.201911164

M3 - Article

C2 - 31591796

AN - SCOPUS:85074867816

VL - 58

SP - 18654

EP - 18662

JO - Angewandte Chemie - International Edition

JF - Angewandte Chemie - International Edition

SN - 1433-7851

IS - 51

ER -

An Hetero-Epitaxially Grown Zeolite Membrane

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this