Analysis of C-V characteristics of MIS structure using P3HT and various gate insulators

Jung Seok Kim, Byoung Min Kim, Jong Hyeon Chang, Byeong Kwon Ju, James Jungho Pak

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The performance of OTFT depends on the gate insulator(GI) and active layer. Therefore, this paper presents C-V characteristics of various gate insulators which may be used in the fabrication of OTFT devices using P3HT as an active layer in order to find the best gate insulator for OTFT devices with P3HT. Poly(4-vinylphenol) (PVP) , poly (vinyl alcohol) (PVA), poly(9-vinylcarbazole) (PVK), benzocyclobutene(BCB) and polyimide(PI) were used as polymer GIs for the soluble process, and poly ( 3-hexylthiophene) ( P3HT) of p-type, which has a relatively high mobility of 0.1 cm2V-1s-1, was selected as an active layer. The C-V of metal-insulator-semiconductor(MIS) was measured and an-alyzed for the drive ability. The spin coating rpm and following bake temperature of P3HT active layer were varied in order to evaluate their effect to the C-V results. The C-V measurement of the fabricated MIS structures were performed at 100 kHz at the bias from to -5 V to 5 V with aO. 1 V step. Also, the C-V measurement frequency was varied to 100 Hz, 1 kHz, 10 kHz and 100 kHz to investigate the low-f and high-f results. The measured capacitances per unit area for of PVP, PVA, PVK, BCB and PI were 1.06, 2.73, 2.94, 3.43 and 2.78 nF/cm2, and threshold voltages were -0.4, -0.7, -1.6,-0.1 and -0.2V, respectively. As the frequency increased, the all capacitances decreased, however the range of the change was only within 1.0-1.5 nF/cm2. The C-V characteristics of the MIS structures were not affected by, and the P3HT thickness or baking condition. It is also suspected that the morphology of P3HT was related with difference of the capacitance and the hole mobility, the combination of PVK and P3HT showed the best result for the OTFT device , which showed continuous capacitance of 3.43 nF/cm2 and the lowest V th of -1.6V.

Original languageEnglish
Title of host publicationAD'07 - Proceedings of Asia Display 2007
Pages1708-1712
Number of pages5
Volume2
Publication statusPublished - 2007 Dec 1
EventAsia Display 2007, AD'07 - Shanghai, China
Duration: 2007 Mar 122007 Mar 16

Other

OtherAsia Display 2007, AD'07
CountryChina
CityShanghai
Period07/3/1207/3/16

Fingerprint

Capacitance
Semiconductor materials
Metals
Polyimides
Alcohols
Hole mobility
Spin coating
Threshold voltage
Fabrication
Polymers
Temperature

Keywords

  • C-V characteristics
  • Capacitance
  • Gate insulator
  • P3HT

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Kim, J. S., Kim, B. M., Chang, J. H., Ju, B. K., & Pak, J. J. (2007). Analysis of C-V characteristics of MIS structure using P3HT and various gate insulators. In AD'07 - Proceedings of Asia Display 2007 (Vol. 2, pp. 1708-1712)

Analysis of C-V characteristics of MIS structure using P3HT and various gate insulators. / Kim, Jung Seok; Kim, Byoung Min; Chang, Jong Hyeon; Ju, Byeong Kwon; Pak, James Jungho.

AD'07 - Proceedings of Asia Display 2007. Vol. 2 2007. p. 1708-1712.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kim, JS, Kim, BM, Chang, JH, Ju, BK & Pak, JJ 2007, Analysis of C-V characteristics of MIS structure using P3HT and various gate insulators. in AD'07 - Proceedings of Asia Display 2007. vol. 2, pp. 1708-1712, Asia Display 2007, AD'07, Shanghai, China, 07/3/12.
Kim JS, Kim BM, Chang JH, Ju BK, Pak JJ. Analysis of C-V characteristics of MIS structure using P3HT and various gate insulators. In AD'07 - Proceedings of Asia Display 2007. Vol. 2. 2007. p. 1708-1712
Kim, Jung Seok ; Kim, Byoung Min ; Chang, Jong Hyeon ; Ju, Byeong Kwon ; Pak, James Jungho. / Analysis of C-V characteristics of MIS structure using P3HT and various gate insulators. AD'07 - Proceedings of Asia Display 2007. Vol. 2 2007. pp. 1708-1712
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