Analysis of the negative charges injected into a SiO2/SiNx stack using plasma charging technology for field-effect passivation on a boron-doped silicon surface

Kwan Hong Min, Jeong Mo Hwang, Eunwan Cho, Hee eun Song, Sungeun Park, Ajeet Rohatgi, Donghwan Kim, Hae Seok Lee, Yoonmook Kang, Young Woo Ok, Min Gu Kang

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Engineering & Materials Science

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Chemical Compounds