Analytical calculation and fabrication of FET-embedded capacitive micromachined ultrasonic transducer

Jin Soo Park, Jung Yeon Kim, Hee Kyoung Bae, Jinsik Kim, Kyo Seon Hwang, Jung ho Park, Rino Choi, Byung Chul Lee

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In IUS 2016, we proposed a capacitive micromachined ultrasonic transducer embedded a field effect transistor (CMUT-FET) for 20 MHz operation. As a result, the possibility of high sensitivity in a high-frequency range was verified via a combination of two simulation tools, a 3-D finite element analysis (FEA) for the CMUT part and a technology computer aided design for the FET part. Since the results were acquired from the separate models, the exact voltage drop of the channel capacitance in the FET part was not considered into the CMUT simulation part. In this paper, we suggest a full analytic model which can simulate the whole CMUT-FET model with high accuracy and fast computation. As a consecutive work, we also report on a fabrication process of the CMUT-FET with nickel silicide source/drain contacts and low-temperature wafer bonding. Since high-temperature process on the upper CMUT during direct wafer bonding critically affects the performance of the lower FET, several low-temperature direct wafer bondings were attempted and the results were demonstrated in this paper.

Original languageEnglish
Title of host publication2017 IEEE International Ultrasonics Symposium, IUS 2017
PublisherIEEE Computer Society
ISBN (Electronic)9781538633830
DOIs
Publication statusPublished - 2017 Oct 31
Event2017 IEEE International Ultrasonics Symposium, IUS 2017 - Washington, United States
Duration: 2017 Sep 62017 Sep 9

Other

Other2017 IEEE International Ultrasonics Symposium, IUS 2017
CountryUnited States
CityWashington
Period17/9/617/9/9

Fingerprint

transducers
field effect transistors
ultrasonics
fabrication
wafers
Inertial Upper Stage
computer aided design
simulation
frequency ranges
capacitance
nickel
sensitivity
electric potential

ASJC Scopus subject areas

  • Acoustics and Ultrasonics

Cite this

Park, J. S., Kim, J. Y., Bae, H. K., Kim, J., Hwang, K. S., Park, J. H., ... Lee, B. C. (2017). Analytical calculation and fabrication of FET-embedded capacitive micromachined ultrasonic transducer. In 2017 IEEE International Ultrasonics Symposium, IUS 2017 [8092863] IEEE Computer Society. https://doi.org/10.1109/ULTSYM.2017.8092863

Analytical calculation and fabrication of FET-embedded capacitive micromachined ultrasonic transducer. / Park, Jin Soo; Kim, Jung Yeon; Bae, Hee Kyoung; Kim, Jinsik; Hwang, Kyo Seon; Park, Jung ho; Choi, Rino; Lee, Byung Chul.

2017 IEEE International Ultrasonics Symposium, IUS 2017. IEEE Computer Society, 2017. 8092863.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Park, JS, Kim, JY, Bae, HK, Kim, J, Hwang, KS, Park, JH, Choi, R & Lee, BC 2017, Analytical calculation and fabrication of FET-embedded capacitive micromachined ultrasonic transducer. in 2017 IEEE International Ultrasonics Symposium, IUS 2017., 8092863, IEEE Computer Society, 2017 IEEE International Ultrasonics Symposium, IUS 2017, Washington, United States, 17/9/6. https://doi.org/10.1109/ULTSYM.2017.8092863
Park JS, Kim JY, Bae HK, Kim J, Hwang KS, Park JH et al. Analytical calculation and fabrication of FET-embedded capacitive micromachined ultrasonic transducer. In 2017 IEEE International Ultrasonics Symposium, IUS 2017. IEEE Computer Society. 2017. 8092863 https://doi.org/10.1109/ULTSYM.2017.8092863
Park, Jin Soo ; Kim, Jung Yeon ; Bae, Hee Kyoung ; Kim, Jinsik ; Hwang, Kyo Seon ; Park, Jung ho ; Choi, Rino ; Lee, Byung Chul. / Analytical calculation and fabrication of FET-embedded capacitive micromachined ultrasonic transducer. 2017 IEEE International Ultrasonics Symposium, IUS 2017. IEEE Computer Society, 2017.
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