Analytical study of polymer deposition distribution for two-dimensional trench sidewall in low-k fluorocarbon plasma etching process

Sun Woo Kim, Hwan Jun Zang, June Park, Gwang Sik Kim, Hyun-Yong Yu, Minwoo Ha, Kyungbo Ko, Sang Soo Park, Choon Hwan Kim

Research output: Contribution to journalArticle

Abstract

In this study, a new polymer deposition distribution model for a two-dimensional low-k porous SiOCH trench structure during the fluorocarbon plasma etching process is described so as to investigate the bowing effect in a nanoscale trench. The model consists of three processes, namely, (1) polymer reflection, (2) ion-assisted polymer deposition, and (3) ion-assisted polymer emission. To calculate the distribution of the polymer, the polymer flux arrived at the surface points of the trench was calculated based on the model. To estimate the profile of the trench, the flux of the etchants at the point of the trench surface was also considered. The simulated etching process is based on a simple flux model, which takes into account angular distributions for ions and radicals from the sheath edge to the trench. Simulation results show that the lower section of the sidewall had a larger number of polymer particles than the other positions of the sidewall did. According to the simulated results, the sidewall bowing amount was estimated to be about 2.9 nm and the bowing position was approximately 29.8 nm at a trench depth of about 148.5 nm. With the proposed polymer distribution model, the bowing effect during fluorocarbon plasma etching can be further understood for a nanoscale process.

Original languageEnglish
Article number011802
JournalJournal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
Volume36
Issue number1
DOIs
Publication statusPublished - 2018 Jan 1

Fingerprint

Fluorocarbons
Plasma etching
fluorocarbons
plasma etching
Polymers
Bending (forming)
polymers
Ions
Fluxes
ions
etchants
Angular distribution
sheaths
Etching
angular distribution
etching
estimates

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry

Cite this

Analytical study of polymer deposition distribution for two-dimensional trench sidewall in low-k fluorocarbon plasma etching process. / Kim, Sun Woo; Zang, Hwan Jun; Park, June; Kim, Gwang Sik; Yu, Hyun-Yong; Ha, Minwoo; Ko, Kyungbo; Park, Sang Soo; Kim, Choon Hwan.

In: Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, Vol. 36, No. 1, 011802, 01.01.2018.

Research output: Contribution to journalArticle

Kim, Sun Woo ; Zang, Hwan Jun ; Park, June ; Kim, Gwang Sik ; Yu, Hyun-Yong ; Ha, Minwoo ; Ko, Kyungbo ; Park, Sang Soo ; Kim, Choon Hwan. / Analytical study of polymer deposition distribution for two-dimensional trench sidewall in low-k fluorocarbon plasma etching process. In: Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 2018 ; Vol. 36, No. 1.
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