Anomalous rapid defect annihilation in self-assembled nanopatterns by defect melting

Bong Hoon Kim, So Jung Park, Hyeong Min Jin, Ju Young Kim, Seung Woo Son, Myung Hyun Kim, Chong Min Koo, Jonghwa Shin, Jaeup U. Kim, Sang Ouk Kim

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

Molecular self-assembly commonly suffers from dense structural defect formation. Spontaneous defect annihilation in block copolymer (BCP) self-assembly is particularly retarded due to significant energy barrier for polymer chain diffusion and structural reorganization. Here we present localized defect melting induced by blending short neutral random copolymer chain as an unusual method to promote the defect annihilation in BCP self-assembled nanopatterns. Chemically neutral short random copolymer chains blended with BCPs are specifically localized and induce local disordered states at structural defect sites in the self-assembled nanopatterns. Such localized defect melting relieves the energy penalty for polymer diffusion and morphology reorganization such that spontaneous defect annihilation by mutual coupling is anomalously accelerated upon thermal annealing. Interestingly, neutral random copolymer chain blending also causes morphology-healing self-assembly behavior that can generate large-area highly ordered 10 nm scale nanopattern even upon poorly defined defective prepatterns. Underlying mechanisms of the unusual experimental findings are thoroughly investigated by three-dimensional self-consistent field theory calculation.

Original languageEnglish
Pages (from-to)1190-1196
Number of pages7
JournalNano Letters
Volume15
Issue number2
DOIs
Publication statusPublished - 2015 Feb 11
Externally publishedYes

Fingerprint

Melting
melting
Defects
defects
Self assembly
self assembly
copolymers
Copolymers
block copolymers
Block copolymers
Polymers
Energy barriers
healing
polymers
penalties
self consistent fields
Annealing
annealing
energy
causes

Keywords

  • block copolymer
  • defect
  • nanopattern
  • Self-assembly

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

Cite this

Kim, B. H., Park, S. J., Jin, H. M., Kim, J. Y., Son, S. W., Kim, M. H., ... Kim, S. O. (2015). Anomalous rapid defect annihilation in self-assembled nanopatterns by defect melting. Nano Letters, 15(2), 1190-1196. https://doi.org/10.1021/nl5042935

Anomalous rapid defect annihilation in self-assembled nanopatterns by defect melting. / Kim, Bong Hoon; Park, So Jung; Jin, Hyeong Min; Kim, Ju Young; Son, Seung Woo; Kim, Myung Hyun; Koo, Chong Min; Shin, Jonghwa; Kim, Jaeup U.; Kim, Sang Ouk.

In: Nano Letters, Vol. 15, No. 2, 11.02.2015, p. 1190-1196.

Research output: Contribution to journalArticle

Kim, BH, Park, SJ, Jin, HM, Kim, JY, Son, SW, Kim, MH, Koo, CM, Shin, J, Kim, JU & Kim, SO 2015, 'Anomalous rapid defect annihilation in self-assembled nanopatterns by defect melting', Nano Letters, vol. 15, no. 2, pp. 1190-1196. https://doi.org/10.1021/nl5042935
Kim BH, Park SJ, Jin HM, Kim JY, Son SW, Kim MH et al. Anomalous rapid defect annihilation in self-assembled nanopatterns by defect melting. Nano Letters. 2015 Feb 11;15(2):1190-1196. https://doi.org/10.1021/nl5042935
Kim, Bong Hoon ; Park, So Jung ; Jin, Hyeong Min ; Kim, Ju Young ; Son, Seung Woo ; Kim, Myung Hyun ; Koo, Chong Min ; Shin, Jonghwa ; Kim, Jaeup U. ; Kim, Sang Ouk. / Anomalous rapid defect annihilation in self-assembled nanopatterns by defect melting. In: Nano Letters. 2015 ; Vol. 15, No. 2. pp. 1190-1196.
@article{28469d08b53d4899a09f2f6806a4eac5,
title = "Anomalous rapid defect annihilation in self-assembled nanopatterns by defect melting",
abstract = "Molecular self-assembly commonly suffers from dense structural defect formation. Spontaneous defect annihilation in block copolymer (BCP) self-assembly is particularly retarded due to significant energy barrier for polymer chain diffusion and structural reorganization. Here we present localized defect melting induced by blending short neutral random copolymer chain as an unusual method to promote the defect annihilation in BCP self-assembled nanopatterns. Chemically neutral short random copolymer chains blended with BCPs are specifically localized and induce local disordered states at structural defect sites in the self-assembled nanopatterns. Such localized defect melting relieves the energy penalty for polymer diffusion and morphology reorganization such that spontaneous defect annihilation by mutual coupling is anomalously accelerated upon thermal annealing. Interestingly, neutral random copolymer chain blending also causes morphology-healing self-assembly behavior that can generate large-area highly ordered 10 nm scale nanopattern even upon poorly defined defective prepatterns. Underlying mechanisms of the unusual experimental findings are thoroughly investigated by three-dimensional self-consistent field theory calculation.",
keywords = "block copolymer, defect, nanopattern, Self-assembly",
author = "Kim, {Bong Hoon} and Park, {So Jung} and Jin, {Hyeong Min} and Kim, {Ju Young} and Son, {Seung Woo} and Kim, {Myung Hyun} and Koo, {Chong Min} and Jonghwa Shin and Kim, {Jaeup U.} and Kim, {Sang Ouk}",
year = "2015",
month = "2",
day = "11",
doi = "10.1021/nl5042935",
language = "English",
volume = "15",
pages = "1190--1196",
journal = "Nano Letters",
issn = "1530-6984",
publisher = "American Chemical Society",
number = "2",

}

TY - JOUR

T1 - Anomalous rapid defect annihilation in self-assembled nanopatterns by defect melting

AU - Kim, Bong Hoon

AU - Park, So Jung

AU - Jin, Hyeong Min

AU - Kim, Ju Young

AU - Son, Seung Woo

AU - Kim, Myung Hyun

AU - Koo, Chong Min

AU - Shin, Jonghwa

AU - Kim, Jaeup U.

AU - Kim, Sang Ouk

PY - 2015/2/11

Y1 - 2015/2/11

N2 - Molecular self-assembly commonly suffers from dense structural defect formation. Spontaneous defect annihilation in block copolymer (BCP) self-assembly is particularly retarded due to significant energy barrier for polymer chain diffusion and structural reorganization. Here we present localized defect melting induced by blending short neutral random copolymer chain as an unusual method to promote the defect annihilation in BCP self-assembled nanopatterns. Chemically neutral short random copolymer chains blended with BCPs are specifically localized and induce local disordered states at structural defect sites in the self-assembled nanopatterns. Such localized defect melting relieves the energy penalty for polymer diffusion and morphology reorganization such that spontaneous defect annihilation by mutual coupling is anomalously accelerated upon thermal annealing. Interestingly, neutral random copolymer chain blending also causes morphology-healing self-assembly behavior that can generate large-area highly ordered 10 nm scale nanopattern even upon poorly defined defective prepatterns. Underlying mechanisms of the unusual experimental findings are thoroughly investigated by three-dimensional self-consistent field theory calculation.

AB - Molecular self-assembly commonly suffers from dense structural defect formation. Spontaneous defect annihilation in block copolymer (BCP) self-assembly is particularly retarded due to significant energy barrier for polymer chain diffusion and structural reorganization. Here we present localized defect melting induced by blending short neutral random copolymer chain as an unusual method to promote the defect annihilation in BCP self-assembled nanopatterns. Chemically neutral short random copolymer chains blended with BCPs are specifically localized and induce local disordered states at structural defect sites in the self-assembled nanopatterns. Such localized defect melting relieves the energy penalty for polymer diffusion and morphology reorganization such that spontaneous defect annihilation by mutual coupling is anomalously accelerated upon thermal annealing. Interestingly, neutral random copolymer chain blending also causes morphology-healing self-assembly behavior that can generate large-area highly ordered 10 nm scale nanopattern even upon poorly defined defective prepatterns. Underlying mechanisms of the unusual experimental findings are thoroughly investigated by three-dimensional self-consistent field theory calculation.

KW - block copolymer

KW - defect

KW - nanopattern

KW - Self-assembly

UR - http://www.scopus.com/inward/record.url?scp=84922748432&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84922748432&partnerID=8YFLogxK

U2 - 10.1021/nl5042935

DO - 10.1021/nl5042935

M3 - Article

AN - SCOPUS:84922748432

VL - 15

SP - 1190

EP - 1196

JO - Nano Letters

JF - Nano Letters

SN - 1530-6984

IS - 2

ER -