Anti-reflection and hydrophobic characteristics of M-PDMS based moth-eye nano-patterns on protection glass of photovoltaic systems

Ju Hyeon Shin, Kang Soo Han, Heon Lee

Research output: Contribution to journalArticle

42 Citations (Scopus)

Abstract

To maximize the incident light, moth-eye nano-patterns were formed on a glass plate that was used as the protection glass for photovoltaic systems. These moth-eye nano-patterns were formed using a nano-imprint lithography process and increased the transmittance of the glass plate by minimizing the reflection of light at the surface. After the formation of the moth-eye nano-patterns, the surface was coated with a trichloro-silane based self-assembled monolayer in order to create a hydrophobic surface because the hydrophobic surface induced a self-cleaning effect. The transmittance of the glass plate increased from 91 to 94% at wavelength of 500 nm after the moth-eye structure was introduced. Thus, the short circuit current (JSC) of the I-V characteristics and the charged capacity of the photovoltaic system increased up to 6% after replacing the conventional protection glass with the moth-eye nano-patterned glass. The durability of the moth-eye nano-patterns was evaluated with respect to an acidic environment, high temperatures and UV irradiation. From these evaluation results, the values of the transmittance and contact angle did not decrease after the nano-patterns were soaked in sulfuric acid solutions with a pH of 2.0 for 48 h, exposed to a temperature of 120°C for 48 h, and irradiated 10 times with UV light for 4 h.

Original languageEnglish
Pages (from-to)339-344
Number of pages6
JournalProgress in Photovoltaics: Research and Applications
Volume19
Issue number3
DOIs
Publication statusPublished - 2011 May 1

Fingerprint

moths
Glass
glass
transmittance
high temperature environments
Silanes
Self assembled monolayers
sulfuric acid
short circuit currents
durability
Sulfuric acid
silanes
Ultraviolet radiation
Short circuit currents
Lithography
cleaning
Contact angle
Cleaning
Durability
lithography

Keywords

  • M-PDMS
  • moth-eye pattern
  • nano-imprint lithography
  • photovoltaic system
  • self-cleaning
  • transmittance

ASJC Scopus subject areas

  • Renewable Energy, Sustainability and the Environment
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Anti-reflection and hydrophobic characteristics of M-PDMS based moth-eye nano-patterns on protection glass of photovoltaic systems. / Shin, Ju Hyeon; Han, Kang Soo; Lee, Heon.

In: Progress in Photovoltaics: Research and Applications, Vol. 19, No. 3, 01.05.2011, p. 339-344.

Research output: Contribution to journalArticle

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