A simple and rapid room-temperature aerosol deposition method was used to fabricate TiO2 films for photokilling/photdegradation applications. TiO2 particles were accelerated to supersonic speeds and fractured upon impacting a glass substrate to form a functional thin film, a process known as aerosol deposition. After deposition, the films were annealed at various temperatures, and their photokilling/photodegradation performances following ultraviolet (UV) exposure were evaluated by counting the number of surviving bacterial colonies, and by a methylene blue decolorization test. The photocatalytic performances of all TiO2 films were obtained under weak UV exposure (0.6 mW/cm2). The film density, crystalline phase, and surface roughness (morphology) were measured by scanning electron microscopy, X-ray diffraction, UV-visible spectroscopy, and atomic force microscopy. The unique, self-assembled honeycomb structure of the aerosol deposited films contributed to the increase in surface area because of extreme roughness, which enhances the photokilling and photodegradation performance. Nonannealed films yielded the best photocatalytic performance due to their small crystalline sizes and large surface areas due to increased surface roughness.
ASJC Scopus subject areas
- Environmental Chemistry