Application of TiO 2 photocatalysts to NO and SO 2 remov in the dielectric barrier discharge process

Anna Nasonova, Dong Joo Kim, Kyo Seon Kim, Woosik Kim, Tawatchai Charinpanitkul

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

The dielectric barrier discharge process combined with a TiO 2 photocatalyst was applied to remove NO and SO 2. The dielectric barrier discharge reactor was packed with glass beads as a dielectric material and the glass beads were coated with TiO 2 particles by dip-coating into solutions of TiO 2 particles prepared by using sol-gel method and of Degussa P-25 TiO 2 particles. The TiO 2 thin film dip-coated 1 time into the solution of TiO 2 prepared by using the sol-gel method was the most uniform and efficient for NO and SO 2 removal when using a dielectric barrier discharge photocatalyst hybrid system. The increase in the applied peak voltage enhanced the NO and SO 2 removal efficiencies. The NO and SO 2 removal efficiencies decreased as the initial NO and SO 2 concentrations were increased.

Original languageEnglish
Pages (from-to)1042-1047
Number of pages6
JournalJournal of the Korean Physical Society
Volume54
Issue number3
DOIs
Publication statusPublished - 2009 Mar 1
Externally publishedYes

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beads
gels
glass
coating
reactors
electric potential
thin films

Keywords

  • Dielectric barrier discharge process
  • NO and SO removal
  • Sol-gel method
  • TiO thin film

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Application of TiO 2 photocatalysts to NO and SO 2 remov in the dielectric barrier discharge process. / Nasonova, Anna; Kim, Dong Joo; Kim, Kyo Seon; Kim, Woosik; Charinpanitkul, Tawatchai.

In: Journal of the Korean Physical Society, Vol. 54, No. 3, 01.03.2009, p. 1042-1047.

Research output: Contribution to journalArticle

Nasonova, Anna ; Kim, Dong Joo ; Kim, Kyo Seon ; Kim, Woosik ; Charinpanitkul, Tawatchai. / Application of TiO 2 photocatalysts to NO and SO 2 remov in the dielectric barrier discharge process. In: Journal of the Korean Physical Society. 2009 ; Vol. 54, No. 3. pp. 1042-1047.
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