Assessment of dry etching damage in permalloy thin films

S. D. Kim, J. J. Lee, Sang Ho Lim, H. J. Kim

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

Surface damage due to etching was investigated in permalloy (Ni81Fe19) thin films. The films were etched by ion beam etching or reactive ion etching and changes in magnetic properties with etching time was investigated. Low energy ion bombardment affected the soft magnetic properties of the films, leading to consequent deterioration of the magnetic softness.

Original languageEnglish
Pages (from-to)5992-5994
Number of pages3
JournalJournal of Applied Physics
Volume85
Issue number8 II B
Publication statusPublished - 1999 Apr 15
Externally publishedYes

Fingerprint

Permalloys (trademark)
etching
damage
thin films
magnetic properties
softness
deterioration
bombardment
ions
ion beams
energy

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physics and Astronomy (miscellaneous)

Cite this

Kim, S. D., Lee, J. J., Lim, S. H., & Kim, H. J. (1999). Assessment of dry etching damage in permalloy thin films. Journal of Applied Physics, 85(8 II B), 5992-5994.

Assessment of dry etching damage in permalloy thin films. / Kim, S. D.; Lee, J. J.; Lim, Sang Ho; Kim, H. J.

In: Journal of Applied Physics, Vol. 85, No. 8 II B, 15.04.1999, p. 5992-5994.

Research output: Contribution to journalArticle

Kim, SD, Lee, JJ, Lim, SH & Kim, HJ 1999, 'Assessment of dry etching damage in permalloy thin films', Journal of Applied Physics, vol. 85, no. 8 II B, pp. 5992-5994.
Kim SD, Lee JJ, Lim SH, Kim HJ. Assessment of dry etching damage in permalloy thin films. Journal of Applied Physics. 1999 Apr 15;85(8 II B):5992-5994.
Kim, S. D. ; Lee, J. J. ; Lim, Sang Ho ; Kim, H. J. / Assessment of dry etching damage in permalloy thin films. In: Journal of Applied Physics. 1999 ; Vol. 85, No. 8 II B. pp. 5992-5994.
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