Assessment of dry etching damage in permalloy thin films

S. D. Kim, J. J. Lee, S. H. Lim, H. J. Kim

Research output: Contribution to journalConference article

16 Citations (Scopus)

Abstract

Surface damage due to etching was investigated in permalloy (Ni81Fe19) thin films. The films were etched by ion beam etching or reactive ion etching and changes in magnetic properties with etching time was investigated. Low energy ion bombardment affected the soft magnetic properties of the films, leading to consequent deterioration of the magnetic softness.

Original languageEnglish
Pages (from-to)5992-5994
Number of pages3
JournalJournal of Applied Physics
Volume85
Issue number8 II B
Publication statusPublished - 1999 Apr 15
Externally publishedYes
EventProceedings of the 43rd Annual Conference on Magnetism and Magnetic Materials - Miami, FL, USA
Duration: 1998 Nov 91998 Nov 12

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ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Kim, S. D., Lee, J. J., Lim, S. H., & Kim, H. J. (1999). Assessment of dry etching damage in permalloy thin films. Journal of Applied Physics, 85(8 II B), 5992-5994.