Atomic Force Microscopy Study of the Polymeric Nanotemplate Fabricated via a Microphase Separation and Subsequent Selective Etching of (PS-b-PI) Copolymer Thin Film

Jonghyurk Park, Jeong Sook Ha, Jinsook Ryu, Taihyun Chano

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

We have investigated the evolution of surface morphology with thin-film growth of polystyrene (PS)-polyisoprene (PI) diblock copolymer and fabrication of polymer nano-template by atomic force microscopy (AFM). Well-controlled (PS-b-PI) diblock copolymer (PI weight fraction = 0.16, M w = 85000, and M w/M n = 1.01) was prepared by living anionic polymerization. Spin coated copolymer film on both the hydrophobic Si and hydrophilic oxide and nitride substrates showed a typical layer-by-layer growth mode. The (PS-b-PI) diblock copolymer film became spontaneously ordered after overnight annealing inside a vacuum oven above their glass transition temperature, giving hexagonal-close-packed (hep) phase of PI spheres. The well-controlled monolayer film was selectively etched via ozonation to obtain PI sphere voids and then subsequently reacted with CF 4 + ions to etch the PS matrix. We obtained the AFM image of the surface morphology of such formed polymer template, whose pattern consisted of 20-nm-size spheres with a periodicity of 45 nm.

Original languageEnglish
Pages (from-to)762-766
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume43
Issue number2
Publication statusPublished - 2004 Feb 1

Fingerprint

polyisoprenes
Microphase separation
Polyisoprenes
Etching
Atomic force microscopy
Polystyrenes
polystyrene
copolymers
Copolymers
etching
atomic force microscopy
Thin films
thin films
Block copolymers
Surface morphology
templates
Ozonization
Living polymerization
Anionic polymerization
ovens

Keywords

  • Atomic force microscopy
  • Block copolymer
  • Microphase separation
  • Nanotemplate
  • Self-assembly

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

@article{634b5ad6dda048d0a03150bc935fd877,
title = "Atomic Force Microscopy Study of the Polymeric Nanotemplate Fabricated via a Microphase Separation and Subsequent Selective Etching of (PS-b-PI) Copolymer Thin Film",
abstract = "We have investigated the evolution of surface morphology with thin-film growth of polystyrene (PS)-polyisoprene (PI) diblock copolymer and fabrication of polymer nano-template by atomic force microscopy (AFM). Well-controlled (PS-b-PI) diblock copolymer (PI weight fraction = 0.16, M w = 85000, and M w/M n = 1.01) was prepared by living anionic polymerization. Spin coated copolymer film on both the hydrophobic Si and hydrophilic oxide and nitride substrates showed a typical layer-by-layer growth mode. The (PS-b-PI) diblock copolymer film became spontaneously ordered after overnight annealing inside a vacuum oven above their glass transition temperature, giving hexagonal-close-packed (hep) phase of PI spheres. The well-controlled monolayer film was selectively etched via ozonation to obtain PI sphere voids and then subsequently reacted with CF 4 + ions to etch the PS matrix. We obtained the AFM image of the surface morphology of such formed polymer template, whose pattern consisted of 20-nm-size spheres with a periodicity of 45 nm.",
keywords = "Atomic force microscopy, Block copolymer, Microphase separation, Nanotemplate, Self-assembly",
author = "Jonghyurk Park and Ha, {Jeong Sook} and Jinsook Ryu and Taihyun Chano",
year = "2004",
month = "2",
day = "1",
language = "English",
volume = "43",
pages = "762--766",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "2",

}

TY - JOUR

T1 - Atomic Force Microscopy Study of the Polymeric Nanotemplate Fabricated via a Microphase Separation and Subsequent Selective Etching of (PS-b-PI) Copolymer Thin Film

AU - Park, Jonghyurk

AU - Ha, Jeong Sook

AU - Ryu, Jinsook

AU - Chano, Taihyun

PY - 2004/2/1

Y1 - 2004/2/1

N2 - We have investigated the evolution of surface morphology with thin-film growth of polystyrene (PS)-polyisoprene (PI) diblock copolymer and fabrication of polymer nano-template by atomic force microscopy (AFM). Well-controlled (PS-b-PI) diblock copolymer (PI weight fraction = 0.16, M w = 85000, and M w/M n = 1.01) was prepared by living anionic polymerization. Spin coated copolymer film on both the hydrophobic Si and hydrophilic oxide and nitride substrates showed a typical layer-by-layer growth mode. The (PS-b-PI) diblock copolymer film became spontaneously ordered after overnight annealing inside a vacuum oven above their glass transition temperature, giving hexagonal-close-packed (hep) phase of PI spheres. The well-controlled monolayer film was selectively etched via ozonation to obtain PI sphere voids and then subsequently reacted with CF 4 + ions to etch the PS matrix. We obtained the AFM image of the surface morphology of such formed polymer template, whose pattern consisted of 20-nm-size spheres with a periodicity of 45 nm.

AB - We have investigated the evolution of surface morphology with thin-film growth of polystyrene (PS)-polyisoprene (PI) diblock copolymer and fabrication of polymer nano-template by atomic force microscopy (AFM). Well-controlled (PS-b-PI) diblock copolymer (PI weight fraction = 0.16, M w = 85000, and M w/M n = 1.01) was prepared by living anionic polymerization. Spin coated copolymer film on both the hydrophobic Si and hydrophilic oxide and nitride substrates showed a typical layer-by-layer growth mode. The (PS-b-PI) diblock copolymer film became spontaneously ordered after overnight annealing inside a vacuum oven above their glass transition temperature, giving hexagonal-close-packed (hep) phase of PI spheres. The well-controlled monolayer film was selectively etched via ozonation to obtain PI sphere voids and then subsequently reacted with CF 4 + ions to etch the PS matrix. We obtained the AFM image of the surface morphology of such formed polymer template, whose pattern consisted of 20-nm-size spheres with a periodicity of 45 nm.

KW - Atomic force microscopy

KW - Block copolymer

KW - Microphase separation

KW - Nanotemplate

KW - Self-assembly

UR - http://www.scopus.com/inward/record.url?scp=2142808857&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=2142808857&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:2142808857

VL - 43

SP - 762

EP - 766

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 2

ER -