Atomic Force Microscopy Study of the Polymeric Nanotemplate Fabricated via a Microphase Separation and Subsequent Selective Etching of (PS-b-PI) Copolymer Thin Film

Jonghyurk Park, Jeong Sook Ha, Jinsook Ryu, Taihyun Chano

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

We have investigated the evolution of surface morphology with thin-film growth of polystyrene (PS)-polyisoprene (PI) diblock copolymer and fabrication of polymer nano-template by atomic force microscopy (AFM). Well-controlled (PS-b-PI) diblock copolymer (PI weight fraction = 0.16, M w = 85000, and M w/M n = 1.01) was prepared by living anionic polymerization. Spin coated copolymer film on both the hydrophobic Si and hydrophilic oxide and nitride substrates showed a typical layer-by-layer growth mode. The (PS-b-PI) diblock copolymer film became spontaneously ordered after overnight annealing inside a vacuum oven above their glass transition temperature, giving hexagonal-close-packed (hep) phase of PI spheres. The well-controlled monolayer film was selectively etched via ozonation to obtain PI sphere voids and then subsequently reacted with CF 4 + ions to etch the PS matrix. We obtained the AFM image of the surface morphology of such formed polymer template, whose pattern consisted of 20-nm-size spheres with a periodicity of 45 nm.

Original languageEnglish
Pages (from-to)762-766
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume43
Issue number2
Publication statusPublished - 2004 Feb 1

Keywords

  • Atomic force microscopy
  • Block copolymer
  • Microphase separation
  • Nanotemplate
  • Self-assembly

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'Atomic Force Microscopy Study of the Polymeric Nanotemplate Fabricated via a Microphase Separation and Subsequent Selective Etching of (PS-b-PI) Copolymer Thin Film'. Together they form a unique fingerprint.

  • Cite this