Atomic layer deposition of ruthenium in various precursors and oxygen doses

Jun Woo Kim, Kyung Sik Son, Byungwoo Kim, Woong Kim, Joon Hyung Shim

Research output: Chapter in Book/Report/Conference proceedingChapter

2 Citations (Scopus)

Abstract

Atomic layer deposition (ALD) of Ru films under various precursor and oxidant supply conditions was carried out at 320°C on silicon wafers. The Ru precursor used was bis(ethylcyclopentadienyl) ruthenium [Ru(EtCp)2], and oxygen gas was used as the oxidant. The Ru precursor pulse time, oxygen pulse time, and oxygen flow rate were varied, and the effects of these parameters on the morphology of the deposited films were analyzed using scanning electron microscope (SEM) and X-ray diffraction (XRD) analysis. The films showed hollow shell-like bumps, indicating that film growth began with a reaction in the gas phase or in physically adsorbed states. A mismatch between the thermal expansion coefficients of Si and Ru or the existence of residues on the wafer surfaces was suspected to be responsible for the hollow shell-like structures. However, the results of energy-dispersive X-ray spectroscopy (EDS) proved that the latter was not the case.

Original languageEnglish
Title of host publicationECS Transactions
Pages165-171
Number of pages7
Volume50
Edition13
DOIs
Publication statusPublished - 2012 Dec 1
EventSymposium on Atomic Layer Deposition Applications 8 - 222nd ECS Meeting/PRiME 2012 - Honolulu, HI, United States
Duration: 2012 Oct 72012 Oct 12

Other

OtherSymposium on Atomic Layer Deposition Applications 8 - 222nd ECS Meeting/PRiME 2012
CountryUnited States
CityHonolulu, HI
Period12/10/712/10/12

Fingerprint

Atomic layer deposition
Ruthenium
Oxidants
Oxygen
Film growth
Silicon wafers
Gases
X ray diffraction analysis
Thermal expansion
Energy dispersive spectroscopy
Electron microscopes
Flow rate
Scanning

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Kim, J. W., Son, K. S., Kim, B., Kim, W., & Shim, J. H. (2012). Atomic layer deposition of ruthenium in various precursors and oxygen doses. In ECS Transactions (13 ed., Vol. 50, pp. 165-171) https://doi.org/10.1149/05013.0165ecst

Atomic layer deposition of ruthenium in various precursors and oxygen doses. / Kim, Jun Woo; Son, Kyung Sik; Kim, Byungwoo; Kim, Woong; Shim, Joon Hyung.

ECS Transactions. Vol. 50 13. ed. 2012. p. 165-171.

Research output: Chapter in Book/Report/Conference proceedingChapter

Kim, JW, Son, KS, Kim, B, Kim, W & Shim, JH 2012, Atomic layer deposition of ruthenium in various precursors and oxygen doses. in ECS Transactions. 13 edn, vol. 50, pp. 165-171, Symposium on Atomic Layer Deposition Applications 8 - 222nd ECS Meeting/PRiME 2012, Honolulu, HI, United States, 12/10/7. https://doi.org/10.1149/05013.0165ecst
Kim, Jun Woo ; Son, Kyung Sik ; Kim, Byungwoo ; Kim, Woong ; Shim, Joon Hyung. / Atomic layer deposition of ruthenium in various precursors and oxygen doses. ECS Transactions. Vol. 50 13. ed. 2012. pp. 165-171
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