Behavior of subthreshold conduction in junctionless transistors

So Jeong Park, Dae Young Jeon, Laurent Montès, Mireille Mouis, Sylvain Barraud, Gyu Tae Kim, Gérard Ghibaudo

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

In this work, the effect of high channel doping concentration and unique structure of junctionless transistors (JLTs) is investigated in the subthreshold conduction regime. Both experimental results and simulation work show that JLTs have reduced portion of the diffusion conduction and lower effective barrier height between source/drain and the silicon channel in subthreshold regime, compared to conventional inversion-mode (IM) transistors. Finally, it leads to a relatively large DIBL value in JLTs, owing to degraded gate controllability on channel region and strong drain bias effect. However, JLTs showed a better immunity against short channel effect in terms of degradation of the effective barrier height value.

Original languageEnglish
Pages (from-to)58-63
Number of pages6
JournalSolid-State Electronics
Volume124
DOIs
Publication statusPublished - 2016 Oct 1

Keywords

  • DIBL
  • Diffusion current
  • Junctionless transistors (JLT)
  • Less effective barrier height
  • Subthreshold conduction
  • Subthreshold slope

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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