Bias voltage dependence of magnetic tunnel junctions comprising amorphous ferromagnetic CoFeSiB layer with double barriers

H. I. Yim, S. Y. Lee, J. Y. Hwang, J. R. Rhee, B. S. Chun, K. L. Wang, Young-geun Kim, T. W. Kim, S. S. Lee, D. G. Hwang

Research output: Contribution to journalArticle

Abstract

Double-barrier magnetic tunnel junctions (DMTJs) with and without an amorphous ferromagnetic material such as CoFe-SiB 10, CoFe 5/CoFeSiB 5, and CoFe 10 (nm) were prepared and compared to investigate the bias voltage dependence of the tunneling magnetoresistance (TMR) ratio. Typical DMTJ structures were Ta 45/Ru 9.5/IrMn 10/CoFe 7/AlO x/free layer 10/AlO x/CoFe 7/IrMn 10/Ru 60 (in nanometers). The interlayer coupling field and the normalized TMR ratios at the applied voltages of+0.4 and -0.4 V of the amorphous CoFeSiB free-layer DMTJ offer lower and higher values than that of the polycrystalline CoFe free-layer DMTJ, respectively. An amorphous ferromagnetic CoFeSiB layer improves the interface roughness of the free layer/tunnel barrier and, as a result, the interlayer coupling field and bias voltage dependence of the TMR ratio are suppressed at a given voltage.

Original languageEnglish
Pages (from-to)1847-1850
Number of pages4
JournalPhysica Status Solidi (A) Applications and Materials Science
Volume205
Issue number8
DOIs
Publication statusPublished - 2008 Aug 1

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Tunnel junctions
Tunnelling magnetoresistance
Bias voltage
tunnel junctions
electric potential
interlayers
Ferromagnetic materials
Electric potential
ferromagnetic materials
Tunnels
Surface roughness
tunnels
roughness

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Bias voltage dependence of magnetic tunnel junctions comprising amorphous ferromagnetic CoFeSiB layer with double barriers. / Yim, H. I.; Lee, S. Y.; Hwang, J. Y.; Rhee, J. R.; Chun, B. S.; Wang, K. L.; Kim, Young-geun; Kim, T. W.; Lee, S. S.; Hwang, D. G.

In: Physica Status Solidi (A) Applications and Materials Science, Vol. 205, No. 8, 01.08.2008, p. 1847-1850.

Research output: Contribution to journalArticle

Yim, H. I. ; Lee, S. Y. ; Hwang, J. Y. ; Rhee, J. R. ; Chun, B. S. ; Wang, K. L. ; Kim, Young-geun ; Kim, T. W. ; Lee, S. S. ; Hwang, D. G. / Bias voltage dependence of magnetic tunnel junctions comprising amorphous ferromagnetic CoFeSiB layer with double barriers. In: Physica Status Solidi (A) Applications and Materials Science. 2008 ; Vol. 205, No. 8. pp. 1847-1850.
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abstract = "Double-barrier magnetic tunnel junctions (DMTJs) with and without an amorphous ferromagnetic material such as CoFe-SiB 10, CoFe 5/CoFeSiB 5, and CoFe 10 (nm) were prepared and compared to investigate the bias voltage dependence of the tunneling magnetoresistance (TMR) ratio. Typical DMTJ structures were Ta 45/Ru 9.5/IrMn 10/CoFe 7/AlO x/free layer 10/AlO x/CoFe 7/IrMn 10/Ru 60 (in nanometers). The interlayer coupling field and the normalized TMR ratios at the applied voltages of+0.4 and -0.4 V of the amorphous CoFeSiB free-layer DMTJ offer lower and higher values than that of the polycrystalline CoFe free-layer DMTJ, respectively. An amorphous ferromagnetic CoFeSiB layer improves the interface roughness of the free layer/tunnel barrier and, as a result, the interlayer coupling field and bias voltage dependence of the TMR ratio are suppressed at a given voltage.",
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AU - Rhee, J. R.

AU - Chun, B. S.

AU - Wang, K. L.

AU - Kim, Young-geun

AU - Kim, T. W.

AU - Lee, S. S.

AU - Hwang, D. G.

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N2 - Double-barrier magnetic tunnel junctions (DMTJs) with and without an amorphous ferromagnetic material such as CoFe-SiB 10, CoFe 5/CoFeSiB 5, and CoFe 10 (nm) were prepared and compared to investigate the bias voltage dependence of the tunneling magnetoresistance (TMR) ratio. Typical DMTJ structures were Ta 45/Ru 9.5/IrMn 10/CoFe 7/AlO x/free layer 10/AlO x/CoFe 7/IrMn 10/Ru 60 (in nanometers). The interlayer coupling field and the normalized TMR ratios at the applied voltages of+0.4 and -0.4 V of the amorphous CoFeSiB free-layer DMTJ offer lower and higher values than that of the polycrystalline CoFe free-layer DMTJ, respectively. An amorphous ferromagnetic CoFeSiB layer improves the interface roughness of the free layer/tunnel barrier and, as a result, the interlayer coupling field and bias voltage dependence of the TMR ratio are suppressed at a given voltage.

AB - Double-barrier magnetic tunnel junctions (DMTJs) with and without an amorphous ferromagnetic material such as CoFe-SiB 10, CoFe 5/CoFeSiB 5, and CoFe 10 (nm) were prepared and compared to investigate the bias voltage dependence of the tunneling magnetoresistance (TMR) ratio. Typical DMTJ structures were Ta 45/Ru 9.5/IrMn 10/CoFe 7/AlO x/free layer 10/AlO x/CoFe 7/IrMn 10/Ru 60 (in nanometers). The interlayer coupling field and the normalized TMR ratios at the applied voltages of+0.4 and -0.4 V of the amorphous CoFeSiB free-layer DMTJ offer lower and higher values than that of the polycrystalline CoFe free-layer DMTJ, respectively. An amorphous ferromagnetic CoFeSiB layer improves the interface roughness of the free layer/tunnel barrier and, as a result, the interlayer coupling field and bias voltage dependence of the TMR ratio are suppressed at a given voltage.

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