Block copolymer nanolithography: Translation of molecular level control to nanoscale patterns

Joona Bang; Unyong Jeong; Du Yeol Ryu; Thomas P. Russell; Craig J Hawker

doi:10.1002/adma.200803302

Block copolymer nanolithography: Translation of molecular level control to nanoscale patterns

Joona Bang, Unyong Jeong, Du Yeol Ryu, Thomas P. Russell, Craig J Hawker

Department of Chemical and Biological Engineering

Research output: Contribution to journal › Review article › peer-review

620 Citations (Scopus)

Abstract

The self-asembly of block copolymers is a promising platform for the "bottomup" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.

Original language	English
Pages (from-to)	4769-4792
Number of pages	24
Journal	Advanced Materials
Volume	21
Issue number	47
DOIs	https://doi.org/10.1002/adma.200803302
Publication status	Published - 2009 Dec 18

ASJC Scopus subject areas

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.200803302

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title = "Block copolymer nanolithography: Translation of molecular level control to nanoscale patterns",

abstract = "The self-asembly of block copolymers is a promising platform for the {"}bottomup{"} fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.",

author = "Joona Bang and Unyong Jeong and Ryu, {Du Yeol} and Russell, {Thomas P.} and {J Hawker}, Craig",

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T2 - Translation of molecular level control to nanoscale patterns

AU - Bang, Joona

AU - Jeong, Unyong

AU - Ryu, Du Yeol

AU - Russell, Thomas P.

AU - J Hawker, Craig

PY - 2009/12/18

Y1 - 2009/12/18

N2 - The self-asembly of block copolymers is a promising platform for the "bottomup" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.

AB - The self-asembly of block copolymers is a promising platform for the "bottomup" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.

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U2 - 10.1002/adma.200803302

DO - 10.1002/adma.200803302

M3 - Review article

C2 - 21049495

AN - SCOPUS:73949116174

SN - 0935-9648

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SP - 4769

EP - 4792

JO - Advanced Materials

JF - Advanced Materials

IS - 47

ER -

Block copolymer nanolithography: Translation of molecular level control to nanoscale patterns

Abstract

ASJC Scopus subject areas

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