Characteristics of Cu/C films on polymer substrate prepared by room temperature ECR-MOCVD coupled with periodic DC bias

Joong Kee Lee, Hyungduk Ko, Jin Hyun, Dongjin Byun, Byung Won Cho, Dalkeun Park

Research output: Contribution to journalConference article

Abstract

Cu/C films were prepared at room temperature under Cu(hfac)2-Ar-H2 atmosphere in order to obtain metallized polymer by using ECR-MOCVD (Electron Cyclotron Resonance Metal Organic Chemical Vapor Deposition) coupled with periodic DC bias system. Room temperature MOCVD was possible when periodic negative voltage was applied on the polymer substrate. The periodic negative voltage induces ions and radicals to have nucleation reaction on the surface of the substrate. Formation of Cu/C films strongly depends on the periodic negative pattern of DC bias and the electric sheet resistance of the films was controlled from 108 to 100 ohm/sq ranges by process parameters such as microwave power and magnet current. The increase in microwave power and magnet current brought on copper-rich film formation with low electric resistance. On the other hand carbon-rich films with high sheet electric resistance were prepared with decreased values for process parameters aforementioned.

Original languageEnglish
Pages (from-to)339-344
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume734
Publication statusPublished - 2003 Jun 30
EventPolymer/Metal Interfaces and Defect Mediated Phenomena in Ordered Polymers - Boston, MA, United States
Duration: 2002 Dec 22002 Dec 6

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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