Abstract
Recently, flexible and stretchable displays with organic light emitting diodes are one of hottest technical issues in electronic industries. Therefore, the application of polymer substrates is required because current glass-based materials cannot meet the required properties of flexible and stretchable displays. But there are some limitations for using polymers in display substrate such as inferior surface characteristics such as low scratch resistance, low hardness, and so on. Polymers have many additional technical issues like low stiffness, low heat resistance, low barrier properties, and high sensitivity to degradation compared with glass material. The low temperature atomic layer deposition (ALD) can be a good solution as a functional coating on the polymer substrate to resolve such surface characteristic issues. In this study, two oxide thin films, i.e., Al2O3 and ZnO, are deposited on a transparent polyimide (TPI) film substrate using a low temperature thermal ALD technique. To fabricate a reliable and high quality thin film, the pretreatment using O2 plasma was conducted on the surface of TPI. Two oxide thin films are deposited as multilayer thin films by layer-by-layer process to investigate the effect of multilayer deposition of oxide thin films on mechanical properties. Surface morphologies of the deposited thin films are observed using optical microscopy and scanning electron microscope. Chemical characteristics of the deposited thin film are analyzed using x-ray photoelectron spectroscopy. The physical and mechanical characteristics of the Al2O3 and ZnO multilayer thin film are investigated using nanoindentation and microtensile tests.
| Original language | English |
|---|---|
| Article number | 01B110 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 35 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 2017 Jan 1 |
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ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
Cite this
Characterization of Al2O3 and ZnO multilayer thin films deposited by low temperature thermal atomic layer deposition on transparent polyimide. / Song, Seung Hak; Lee, Myoung Youb; Lee, Gyeong Beom; Choi, Byoung-Ho.
In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 35, No. 1, 01B110, 01.01.2017.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Characterization of Al2O3 and ZnO multilayer thin films deposited by low temperature thermal atomic layer deposition on transparent polyimide
AU - Song, Seung Hak
AU - Lee, Myoung Youb
AU - Lee, Gyeong Beom
AU - Choi, Byoung-Ho
PY - 2017/1/1
Y1 - 2017/1/1
N2 - Recently, flexible and stretchable displays with organic light emitting diodes are one of hottest technical issues in electronic industries. Therefore, the application of polymer substrates is required because current glass-based materials cannot meet the required properties of flexible and stretchable displays. But there are some limitations for using polymers in display substrate such as inferior surface characteristics such as low scratch resistance, low hardness, and so on. Polymers have many additional technical issues like low stiffness, low heat resistance, low barrier properties, and high sensitivity to degradation compared with glass material. The low temperature atomic layer deposition (ALD) can be a good solution as a functional coating on the polymer substrate to resolve such surface characteristic issues. In this study, two oxide thin films, i.e., Al2O3 and ZnO, are deposited on a transparent polyimide (TPI) film substrate using a low temperature thermal ALD technique. To fabricate a reliable and high quality thin film, the pretreatment using O2 plasma was conducted on the surface of TPI. Two oxide thin films are deposited as multilayer thin films by layer-by-layer process to investigate the effect of multilayer deposition of oxide thin films on mechanical properties. Surface morphologies of the deposited thin films are observed using optical microscopy and scanning electron microscope. Chemical characteristics of the deposited thin film are analyzed using x-ray photoelectron spectroscopy. The physical and mechanical characteristics of the Al2O3 and ZnO multilayer thin film are investigated using nanoindentation and microtensile tests.
AB - Recently, flexible and stretchable displays with organic light emitting diodes are one of hottest technical issues in electronic industries. Therefore, the application of polymer substrates is required because current glass-based materials cannot meet the required properties of flexible and stretchable displays. But there are some limitations for using polymers in display substrate such as inferior surface characteristics such as low scratch resistance, low hardness, and so on. Polymers have many additional technical issues like low stiffness, low heat resistance, low barrier properties, and high sensitivity to degradation compared with glass material. The low temperature atomic layer deposition (ALD) can be a good solution as a functional coating on the polymer substrate to resolve such surface characteristic issues. In this study, two oxide thin films, i.e., Al2O3 and ZnO, are deposited on a transparent polyimide (TPI) film substrate using a low temperature thermal ALD technique. To fabricate a reliable and high quality thin film, the pretreatment using O2 plasma was conducted on the surface of TPI. Two oxide thin films are deposited as multilayer thin films by layer-by-layer process to investigate the effect of multilayer deposition of oxide thin films on mechanical properties. Surface morphologies of the deposited thin films are observed using optical microscopy and scanning electron microscope. Chemical characteristics of the deposited thin film are analyzed using x-ray photoelectron spectroscopy. The physical and mechanical characteristics of the Al2O3 and ZnO multilayer thin film are investigated using nanoindentation and microtensile tests.
UR - http://www.scopus.com/inward/record.url?scp=84994879684&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84994879684&partnerID=8YFLogxK
U2 - 10.1116/1.4967728
DO - 10.1116/1.4967728
M3 - Article
AN - SCOPUS:84994879684
VL - 35
JO - Journal of Vacuum Science and Technology A
JF - Journal of Vacuum Science and Technology A
SN - 0734-2101
IS - 1
M1 - 01B110
ER -