Characterization of Al2O3 and ZnO multilayer thin films deposited by low temperature thermal atomic layer deposition on transparent polyimide

Seung Hak Song, Myoung Youb Lee, Gyeong Beom Lee, Byoung-Ho Choi

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Recently, flexible and stretchable displays with organic light emitting diodes are one of hottest technical issues in electronic industries. Therefore, the application of polymer substrates is required because current glass-based materials cannot meet the required properties of flexible and stretchable displays. But there are some limitations for using polymers in display substrate such as inferior surface characteristics such as low scratch resistance, low hardness, and so on. Polymers have many additional technical issues like low stiffness, low heat resistance, low barrier properties, and high sensitivity to degradation compared with glass material. The low temperature atomic layer deposition (ALD) can be a good solution as a functional coating on the polymer substrate to resolve such surface characteristic issues. In this study, two oxide thin films, i.e., Al2O3 and ZnO, are deposited on a transparent polyimide (TPI) film substrate using a low temperature thermal ALD technique. To fabricate a reliable and high quality thin film, the pretreatment using O2 plasma was conducted on the surface of TPI. Two oxide thin films are deposited as multilayer thin films by layer-by-layer process to investigate the effect of multilayer deposition of oxide thin films on mechanical properties. Surface morphologies of the deposited thin films are observed using optical microscopy and scanning electron microscope. Chemical characteristics of the deposited thin film are analyzed using x-ray photoelectron spectroscopy. The physical and mechanical characteristics of the Al2O3 and ZnO multilayer thin film are investigated using nanoindentation and microtensile tests.

Original languageEnglish
Article number01B110
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume35
Issue number1
DOIs
Publication statusPublished - 2017 Jan 1

Fingerprint

Atomic layer deposition
Multilayer films
atomic layer epitaxy
polyimides
Polyimides
Thin films
thin films
Polymers
Oxide films
Temperature
Display devices
polymers
Substrates
oxides
Glass
Hot Temperature
glass
Electronics industry
low resistance
Organic light emitting diodes (OLED)

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

@article{addf4e3c7a634268a75247429c3f2c05,
title = "Characterization of Al2O3 and ZnO multilayer thin films deposited by low temperature thermal atomic layer deposition on transparent polyimide",
abstract = "Recently, flexible and stretchable displays with organic light emitting diodes are one of hottest technical issues in electronic industries. Therefore, the application of polymer substrates is required because current glass-based materials cannot meet the required properties of flexible and stretchable displays. But there are some limitations for using polymers in display substrate such as inferior surface characteristics such as low scratch resistance, low hardness, and so on. Polymers have many additional technical issues like low stiffness, low heat resistance, low barrier properties, and high sensitivity to degradation compared with glass material. The low temperature atomic layer deposition (ALD) can be a good solution as a functional coating on the polymer substrate to resolve such surface characteristic issues. In this study, two oxide thin films, i.e., Al2O3 and ZnO, are deposited on a transparent polyimide (TPI) film substrate using a low temperature thermal ALD technique. To fabricate a reliable and high quality thin film, the pretreatment using O2 plasma was conducted on the surface of TPI. Two oxide thin films are deposited as multilayer thin films by layer-by-layer process to investigate the effect of multilayer deposition of oxide thin films on mechanical properties. Surface morphologies of the deposited thin films are observed using optical microscopy and scanning electron microscope. Chemical characteristics of the deposited thin film are analyzed using x-ray photoelectron spectroscopy. The physical and mechanical characteristics of the Al2O3 and ZnO multilayer thin film are investigated using nanoindentation and microtensile tests.",
author = "Song, {Seung Hak} and Lee, {Myoung Youb} and Lee, {Gyeong Beom} and Byoung-Ho Choi",
year = "2017",
month = "1",
day = "1",
doi = "10.1116/1.4967728",
language = "English",
volume = "35",
journal = "Journal of Vacuum Science and Technology A",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "1",

}

TY - JOUR

T1 - Characterization of Al2O3 and ZnO multilayer thin films deposited by low temperature thermal atomic layer deposition on transparent polyimide

AU - Song, Seung Hak

AU - Lee, Myoung Youb

AU - Lee, Gyeong Beom

AU - Choi, Byoung-Ho

PY - 2017/1/1

Y1 - 2017/1/1

N2 - Recently, flexible and stretchable displays with organic light emitting diodes are one of hottest technical issues in electronic industries. Therefore, the application of polymer substrates is required because current glass-based materials cannot meet the required properties of flexible and stretchable displays. But there are some limitations for using polymers in display substrate such as inferior surface characteristics such as low scratch resistance, low hardness, and so on. Polymers have many additional technical issues like low stiffness, low heat resistance, low barrier properties, and high sensitivity to degradation compared with glass material. The low temperature atomic layer deposition (ALD) can be a good solution as a functional coating on the polymer substrate to resolve such surface characteristic issues. In this study, two oxide thin films, i.e., Al2O3 and ZnO, are deposited on a transparent polyimide (TPI) film substrate using a low temperature thermal ALD technique. To fabricate a reliable and high quality thin film, the pretreatment using O2 plasma was conducted on the surface of TPI. Two oxide thin films are deposited as multilayer thin films by layer-by-layer process to investigate the effect of multilayer deposition of oxide thin films on mechanical properties. Surface morphologies of the deposited thin films are observed using optical microscopy and scanning electron microscope. Chemical characteristics of the deposited thin film are analyzed using x-ray photoelectron spectroscopy. The physical and mechanical characteristics of the Al2O3 and ZnO multilayer thin film are investigated using nanoindentation and microtensile tests.

AB - Recently, flexible and stretchable displays with organic light emitting diodes are one of hottest technical issues in electronic industries. Therefore, the application of polymer substrates is required because current glass-based materials cannot meet the required properties of flexible and stretchable displays. But there are some limitations for using polymers in display substrate such as inferior surface characteristics such as low scratch resistance, low hardness, and so on. Polymers have many additional technical issues like low stiffness, low heat resistance, low barrier properties, and high sensitivity to degradation compared with glass material. The low temperature atomic layer deposition (ALD) can be a good solution as a functional coating on the polymer substrate to resolve such surface characteristic issues. In this study, two oxide thin films, i.e., Al2O3 and ZnO, are deposited on a transparent polyimide (TPI) film substrate using a low temperature thermal ALD technique. To fabricate a reliable and high quality thin film, the pretreatment using O2 plasma was conducted on the surface of TPI. Two oxide thin films are deposited as multilayer thin films by layer-by-layer process to investigate the effect of multilayer deposition of oxide thin films on mechanical properties. Surface morphologies of the deposited thin films are observed using optical microscopy and scanning electron microscope. Chemical characteristics of the deposited thin film are analyzed using x-ray photoelectron spectroscopy. The physical and mechanical characteristics of the Al2O3 and ZnO multilayer thin film are investigated using nanoindentation and microtensile tests.

UR - http://www.scopus.com/inward/record.url?scp=84994879684&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84994879684&partnerID=8YFLogxK

U2 - 10.1116/1.4967728

DO - 10.1116/1.4967728

M3 - Article

VL - 35

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

SN - 0734-2101

IS - 1

M1 - 01B110

ER -