Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment

Suk Won Park, Kiho Bae, Jun Woo Kim, Gyeong Beom Lee, Byoung-Ho Choi, Min Hwan Lee, Joon Hyung Shim

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

This study reports the effect of an O2 plasma pretreatment of polycarbonate (PC) films for the enhanced integration of Al2O3 films prepared by atomic layer deposition (ALD) on the PC substrate. It is revealed that the plasma treatment produces functional groups on the PC surface, which are essential for the ALD of Al2O3. Specifically, it is revealed that a significant amount of carbonyl groups, essential for the chemisorption of the precursors and covalent binding with the Al2O3 surface protection layer, are present in the plasma-treated PC surface. To evaluate the chemical resistivity of the PC-ALD alumina film, an acetone immersion test is conducted. As a result, a severe degradation occurs in the plasma-untreated PCs, even with a sufficiently thick ALD alumina protection layer. In contrast, the PCs that are plasma-treated and coated with the ALD alumina exhibit a significantly improved stability against acetone etching. Light transmittance and surface morphology analysis support this improvement.

Original languageEnglish
JournalAdvanced Materials Interfaces
DOIs
Publication statusAccepted/In press - 2016

Keywords

  • Alumina
  • Atomic layer deposition
  • Oxygen plasma
  • Polycarbonates
  • Surface protection layers

ASJC Scopus subject areas

  • Mechanical Engineering
  • Mechanics of Materials

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