Abstract
A lithography technique that combines laser interfi e erence lithography (LIL) and photolithography, which can be a valuable technique for the low cost production of microscale and nanoscale hybrid mask molds, is proposed. LIL is a maskless process which allows the production of periodic nanoscale structures quickly, uniformly, and over large areas. A 257 nm wavelength Ar-Ion laser is utilized for the LIL process incorporating a Lloyd's mirror one beam inteferometer. By combining LIL with photolithography, the non-selective patterning limitation of LIL are explored and the design and development of a hybrid mask mold for nanoimprint lithography process, with uniform two-dimensional nanoscale patterns are presented. Polydimethylsiloxane is applied on the mold to fabricate a replica of the stamp. Through nanoimprint lithography using the manufactured replica, successful transfer of the patterns is achieved, and selective nanoscale patterning is confirmed with pattern sizes of around 180 nm and pattern aspect ratio of around 1.44:1.
| Original language | English |
|---|---|
| Pages (from-to) | 6039-6043 |
| Number of pages | 5 |
| Journal | Journal of Nanoscience and Nanotechnology |
| Volume | 11 |
| Issue number | 7 |
| DOIs | |
| Publication status | Published - 2011 Jul 1 |
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Keywords
- Hybrid Mask Mold
- Laser Interference Lithography (LIL)
- Nanoimprint Lithography
- Photolithography
ASJC Scopus subject areas
- Condensed Matter Physics
- Chemistry(all)
- Materials Science(all)
- Bioengineering
- Biomedical Engineering
Cite this
Combined laser interference and photolithography patterning of a hybrid mask mold for nanoimprint lithography. / Ahn, Sungmo; Choi, Jinnil; Kim, Eunhye; Dong, Ki Young; Jeon, Heonsu; Ju, Byeong Kwon; Lee, Kyu Back.
In: Journal of Nanoscience and Nanotechnology, Vol. 11, No. 7, 01.07.2011, p. 6039-6043.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Combined laser interference and photolithography patterning of a hybrid mask mold for nanoimprint lithography
AU - Ahn, Sungmo
AU - Choi, Jinnil
AU - Kim, Eunhye
AU - Dong, Ki Young
AU - Jeon, Heonsu
AU - Ju, Byeong Kwon
AU - Lee, Kyu Back
PY - 2011/7/1
Y1 - 2011/7/1
N2 - A lithography technique that combines laser interfi e erence lithography (LIL) and photolithography, which can be a valuable technique for the low cost production of microscale and nanoscale hybrid mask molds, is proposed. LIL is a maskless process which allows the production of periodic nanoscale structures quickly, uniformly, and over large areas. A 257 nm wavelength Ar-Ion laser is utilized for the LIL process incorporating a Lloyd's mirror one beam inteferometer. By combining LIL with photolithography, the non-selective patterning limitation of LIL are explored and the design and development of a hybrid mask mold for nanoimprint lithography process, with uniform two-dimensional nanoscale patterns are presented. Polydimethylsiloxane is applied on the mold to fabricate a replica of the stamp. Through nanoimprint lithography using the manufactured replica, successful transfer of the patterns is achieved, and selective nanoscale patterning is confirmed with pattern sizes of around 180 nm and pattern aspect ratio of around 1.44:1.
AB - A lithography technique that combines laser interfi e erence lithography (LIL) and photolithography, which can be a valuable technique for the low cost production of microscale and nanoscale hybrid mask molds, is proposed. LIL is a maskless process which allows the production of periodic nanoscale structures quickly, uniformly, and over large areas. A 257 nm wavelength Ar-Ion laser is utilized for the LIL process incorporating a Lloyd's mirror one beam inteferometer. By combining LIL with photolithography, the non-selective patterning limitation of LIL are explored and the design and development of a hybrid mask mold for nanoimprint lithography process, with uniform two-dimensional nanoscale patterns are presented. Polydimethylsiloxane is applied on the mold to fabricate a replica of the stamp. Through nanoimprint lithography using the manufactured replica, successful transfer of the patterns is achieved, and selective nanoscale patterning is confirmed with pattern sizes of around 180 nm and pattern aspect ratio of around 1.44:1.
KW - Hybrid Mask Mold
KW - Laser Interference Lithography (LIL)
KW - Nanoimprint Lithography
KW - Photolithography
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U2 - 10.1166/jnn.2011.4363
DO - 10.1166/jnn.2011.4363
M3 - Article
C2 - 22121654
AN - SCOPUS:84863078714
VL - 11
SP - 6039
EP - 6043
JO - Journal of Nanoscience and Nanotechnology
JF - Journal of Nanoscience and Nanotechnology
SN - 1533-4880
IS - 7
ER -