Comparison of Interface State Density Characterization Methods for SiO 2/4H-SiC MOS Diodes

J. R. LaRoche, J. Kim, J. W. Johnson, B. Luo, B. S. Kang, R. Mehandru, Y. Irokawa, S. J. Pearton, G. Chung, F. Ren

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)


Four different methods for calculating interface state density in vertical SiO2/4H-SiC metal-oxide semiconductor (MOS) capacitors were employed on the same samples. The Terman, ac, quasi-static, and Hi-Lo methods were used to extract surface state densities from the SiO2/SiC interface. Surface state densities from 1011 to 1012 cm-2 eV-1 were obtained, depending on the method employed. The Hi-Lo method is particularly susceptible to underestimating the trap density if UV light is not used to empty all the deep-lying traps during measurement.

Original languageEnglish
Pages (from-to)G21-G24
JournalElectrochemical and Solid-State Letters
Issue number2
Publication statusPublished - 2004
Externally publishedYes

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Materials Science(all)
  • Physical and Theoretical Chemistry
  • Electrochemistry
  • Electrical and Electronic Engineering


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