Control of the initial growth in atomic layer deposition of Pt films by surface pretreatment

Jung Joon Pyeon, Cheol Jin Cho, Seung Hyub Baek, Chong-Yun Kang, Jin Sang Kim, Doo Seok Jeong, Seong Keun Kim

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

The controllability of the nucleation behavior of Pt in atomic layer deposition (ALD) by surface pretreatments with H<inf>2</inf>O, H<inf>2</inf>S, and NH<inf>3</inf> was investigated. The H<inf>2</inf>O pretreatment on SiO<inf>2</inf> and TiO<inf>2</inf> surfaces had little effect on the nucleation of Pt. The H<inf>2</inf>S pretreatment on the SiO<inf>2</inf> and TiO<inf>2</inf> surfaces significantly delayed the nucleation of Pt on them, while the NH<inf>3</inf> pretreatment on the TiO<inf>2</inf> surface led to fluent nucleation of Pt. In particular, a continuous Pt film was successfully formed even at an ultrathin thickness of approximately 2.2 nm by NH<inf>3</inf> pretreatment. This work suggests that the pretreatment with H<inf>2</inf>S and NH<inf>3</inf> is an efficient way to control the nucleation of Pt in ALD without the support of any reactive species, such as plasma or O<inf>3</inf>. Such a strategy enables the easy control of the size and distribution density of Pt nanoparticles for a wide range of applications.

Original languageEnglish
Article number304003
JournalNanotechnology
Volume26
Issue number30
DOIs
Publication statusPublished - 2015 Jul 31

Fingerprint

Atomic layer deposition
Nucleation
Growth
Nanoparticles
Controllability
TiO2-SiO2
Plasmas

Keywords

  • atomic layer deposition
  • initial growth
  • nucleation behavior
  • Pt
  • surface pretreatment

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Electrical and Electronic Engineering
  • Mechanical Engineering
  • Mechanics of Materials
  • Materials Science(all)

Cite this

Pyeon, J. J., Cho, C. J., Baek, S. H., Kang, C-Y., Kim, J. S., Jeong, D. S., & Kim, S. K. (2015). Control of the initial growth in atomic layer deposition of Pt films by surface pretreatment. Nanotechnology, 26(30), [304003]. https://doi.org/10.1088/0957-4484/26/30/304003

Control of the initial growth in atomic layer deposition of Pt films by surface pretreatment. / Pyeon, Jung Joon; Cho, Cheol Jin; Baek, Seung Hyub; Kang, Chong-Yun; Kim, Jin Sang; Jeong, Doo Seok; Kim, Seong Keun.

In: Nanotechnology, Vol. 26, No. 30, 304003, 31.07.2015.

Research output: Contribution to journalArticle

Pyeon, JJ, Cho, CJ, Baek, SH, Kang, C-Y, Kim, JS, Jeong, DS & Kim, SK 2015, 'Control of the initial growth in atomic layer deposition of Pt films by surface pretreatment', Nanotechnology, vol. 26, no. 30, 304003. https://doi.org/10.1088/0957-4484/26/30/304003
Pyeon, Jung Joon ; Cho, Cheol Jin ; Baek, Seung Hyub ; Kang, Chong-Yun ; Kim, Jin Sang ; Jeong, Doo Seok ; Kim, Seong Keun. / Control of the initial growth in atomic layer deposition of Pt films by surface pretreatment. In: Nanotechnology. 2015 ; Vol. 26, No. 30.
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