Controlled selective growth of ZnO nanorod and microrod arrays on Si substrates by a wet chemical method

Yong Jin Kim, Chul-Ho Lee, Young Joon Hong, Gyu Chul Yi, Sung Soo Kim, Hyeonsik Cheong

Research output: Contribution to journalArticle

114 Citations (Scopus)

Abstract

The use of a wet chemical method to selectively grow ZnO microrod and nanorod arrays on Si substrates is described. To control the size and position of the ZnO microrods and nanorods, polymethylmethacrylate (PMMA) submicron patterns were prepared on the Si substrates with an intermediate ZnO layer using e-beam lithography. Selective growth of the ZnO structures was achieved by the absence of ZnO nucleation sites on the PMMA mask, resulting in position-controlled growth of ZnO structures only on patterned holes where the ZnO layer was exposed. In addition, the diameters of the ZnO microrods were determined by the patterned hole size, and the diameters as small as 250 nm were obtained when a hole diameter of 250 nm was employed. The structural and optical characteristics of the ZnO microrods were further investigated using x-ray diffraction, transmission electron microscopy, and photoluminescence spectroscopy.

Original languageEnglish
Article number163128
JournalApplied Physics Letters
Volume89
Issue number16
DOIs
Publication statusPublished - 2006 Oct 25
Externally publishedYes

Fingerprint

nanorods
x ray diffraction
masks
lithography
nucleation
photoluminescence
transmission electron microscopy
spectroscopy

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Controlled selective growth of ZnO nanorod and microrod arrays on Si substrates by a wet chemical method. / Kim, Yong Jin; Lee, Chul-Ho; Hong, Young Joon; Yi, Gyu Chul; Kim, Sung Soo; Cheong, Hyeonsik.

In: Applied Physics Letters, Vol. 89, No. 16, 163128, 25.10.2006.

Research output: Contribution to journalArticle

Kim, Yong Jin ; Lee, Chul-Ho ; Hong, Young Joon ; Yi, Gyu Chul ; Kim, Sung Soo ; Cheong, Hyeonsik. / Controlled selective growth of ZnO nanorod and microrod arrays on Si substrates by a wet chemical method. In: Applied Physics Letters. 2006 ; Vol. 89, No. 16.
@article{ddbf00ac109a450b8452340f4e623073,
title = "Controlled selective growth of ZnO nanorod and microrod arrays on Si substrates by a wet chemical method",
abstract = "The use of a wet chemical method to selectively grow ZnO microrod and nanorod arrays on Si substrates is described. To control the size and position of the ZnO microrods and nanorods, polymethylmethacrylate (PMMA) submicron patterns were prepared on the Si substrates with an intermediate ZnO layer using e-beam lithography. Selective growth of the ZnO structures was achieved by the absence of ZnO nucleation sites on the PMMA mask, resulting in position-controlled growth of ZnO structures only on patterned holes where the ZnO layer was exposed. In addition, the diameters of the ZnO microrods were determined by the patterned hole size, and the diameters as small as 250 nm were obtained when a hole diameter of 250 nm was employed. The structural and optical characteristics of the ZnO microrods were further investigated using x-ray diffraction, transmission electron microscopy, and photoluminescence spectroscopy.",
author = "Kim, {Yong Jin} and Chul-Ho Lee and Hong, {Young Joon} and Yi, {Gyu Chul} and Kim, {Sung Soo} and Hyeonsik Cheong",
year = "2006",
month = "10",
day = "25",
doi = "10.1063/1.2364162",
language = "English",
volume = "89",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "16",

}

TY - JOUR

T1 - Controlled selective growth of ZnO nanorod and microrod arrays on Si substrates by a wet chemical method

AU - Kim, Yong Jin

AU - Lee, Chul-Ho

AU - Hong, Young Joon

AU - Yi, Gyu Chul

AU - Kim, Sung Soo

AU - Cheong, Hyeonsik

PY - 2006/10/25

Y1 - 2006/10/25

N2 - The use of a wet chemical method to selectively grow ZnO microrod and nanorod arrays on Si substrates is described. To control the size and position of the ZnO microrods and nanorods, polymethylmethacrylate (PMMA) submicron patterns were prepared on the Si substrates with an intermediate ZnO layer using e-beam lithography. Selective growth of the ZnO structures was achieved by the absence of ZnO nucleation sites on the PMMA mask, resulting in position-controlled growth of ZnO structures only on patterned holes where the ZnO layer was exposed. In addition, the diameters of the ZnO microrods were determined by the patterned hole size, and the diameters as small as 250 nm were obtained when a hole diameter of 250 nm was employed. The structural and optical characteristics of the ZnO microrods were further investigated using x-ray diffraction, transmission electron microscopy, and photoluminescence spectroscopy.

AB - The use of a wet chemical method to selectively grow ZnO microrod and nanorod arrays on Si substrates is described. To control the size and position of the ZnO microrods and nanorods, polymethylmethacrylate (PMMA) submicron patterns were prepared on the Si substrates with an intermediate ZnO layer using e-beam lithography. Selective growth of the ZnO structures was achieved by the absence of ZnO nucleation sites on the PMMA mask, resulting in position-controlled growth of ZnO structures only on patterned holes where the ZnO layer was exposed. In addition, the diameters of the ZnO microrods were determined by the patterned hole size, and the diameters as small as 250 nm were obtained when a hole diameter of 250 nm was employed. The structural and optical characteristics of the ZnO microrods were further investigated using x-ray diffraction, transmission electron microscopy, and photoluminescence spectroscopy.

UR - http://www.scopus.com/inward/record.url?scp=33750162811&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33750162811&partnerID=8YFLogxK

U2 - 10.1063/1.2364162

DO - 10.1063/1.2364162

M3 - Article

AN - SCOPUS:33750162811

VL - 89

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 16

M1 - 163128

ER -