Deep traps in GaN-based structures as affecting the performance of GaN devices

Alexander Y. Polyakov, In-Hwan Lee

Research output: Contribution to journalReview article

100 Citations (Scopus)

Abstract

New developments in theoretical studies of defects and impurities in III-Nitrides as pertinent to compensation and recombination in these materials are discussed. New results on experimental studies on defect states of Si, O, Mg, C, Fe in GaN, InGaN, and AlGaN are surveyed. Deep electron and hole traps data reported for GaN and AlGaN are critically assessed. The role of deep defects in trapping in AlGaN/GaN, InAlN/GaN structures and transistors and in degradation of transistor parameters during electrical stress tests and after irradiation is discussed. The recent data on deep traps influence on luminescent efficiency and degradation of characteristics of III-Nitride light emitting devices and laser diodes are reviewed.

Original languageEnglish
Pages (from-to)1-56
Number of pages56
JournalMaterials Science and Engineering R: Reports
Volume94
DOIs
Publication statusPublished - 2015 May 28
Externally publishedYes

Keywords

  • Deep traps
  • Device degradation
  • Dislocations
  • HEMT
  • III-Nitrides
  • LED

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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