Deposition condition and thickness dependence on magnetic properties of sputtered NiFeCo thin films

A. Tsoukatos, S. Gupta, Y. K. Kim

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The soft magnetic properties of polycrystalline NiFeCo films have been investigated in the thickness range of 20-2400 Å. The films were deposited by dc magnetron sputtering, at 5 Å/s, from a Ni66Fe16Co18 high purity target, and under an applied magnetic field of 85 Oe. The effects of deposition pressure on the film crystal structure and magnetic properties have been investigated via x-ray diffraction and magnetic measurements. Both easy and hard axis coercivity values decrease significantly as the deposition pressure was changed from 7 to 3 mTorr, with the corresponding effects observed in the magnetoresistance and anisotropy field values, respectively. The magnetic data at 3 mTorr showed a nonlinear behavior at thicknesses below 1000 Å, while at 7 mTorr the nonlinearity is present in both the low and high end thicknesses.

Original languageEnglish
Pages (from-to)5446-5448
Number of pages3
JournalJournal of Applied Physics
Volume79
Issue number8 PART 2A
DOIs
Publication statusPublished - 1996 Apr 15
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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