Design and fabrication of spectrally selective emitter for thermophotovoltaic system by using nano-imprint lithography

Jong Moo Kim, Keum Hwan Park, Da Som Kim, Bo yeon Hwang, Sun Kyung Kim, Hee Man Chae, Byeong Kwon Ju, Young Seok Kim

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Thermophotovoltaic (TPV) systems have attracted attention as promising power generation systems that can directly convert the radiant energy produced by the combustion of fuel into electrical energy. However, there is a fundamental limit of their conversion efficiency due to the broadband distribution of the radiant spectrum. To overcome this problem, several spectrally selective thermal emitter technologies have been investigated, including the fabrication of photonic crystal (PhC) structures. In this paper, we present some design rules based on finite-a difference time-domain (FDTD) simulation results for tungsten (W) PhC emitter. The W 2D PhC was fabricated by a simple nano-imprint lithography (NIL) process, and inductive coupled plasma reactive ion etching (ICP-RIE) with an isotropic etching process, the benefits and parameters of which are presented. The fabricated W PhC emitter showed spectrally selective emission near the infrared wavelength range, and the optical properties varied depending on the size of the nano-patterns. The measured results of the fabricated prototype structure correspond well to the simulated values. Finally, compared with the performance of a flat W emitter, the total thermal emitter efficiency was almost 3.25 times better with the 2D W PhC structure.

Original languageEnglish
JournalApplied Surface Science
DOIs
Publication statusAccepted/In press - 2017

Fingerprint

Photonic crystals
Lithography
Fabrication
Crystal structure
Tungsten
Plasma etching
Reactive ion etching
Conversion efficiency
Power generation
Etching
Optical properties
Infrared radiation
Wavelength
Hot Temperature

Keywords

  • Nano-imprint lithography
  • Photonic crystal
  • Thermal emitter
  • Thermophotovoltaic

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

Design and fabrication of spectrally selective emitter for thermophotovoltaic system by using nano-imprint lithography. / Kim, Jong Moo; Park, Keum Hwan; Kim, Da Som; Hwang, Bo yeon; Kim, Sun Kyung; Chae, Hee Man; Ju, Byeong Kwon; Kim, Young Seok.

In: Applied Surface Science, 2017.

Research output: Contribution to journalArticle

Kim, Jong Moo ; Park, Keum Hwan ; Kim, Da Som ; Hwang, Bo yeon ; Kim, Sun Kyung ; Chae, Hee Man ; Ju, Byeong Kwon ; Kim, Young Seok. / Design and fabrication of spectrally selective emitter for thermophotovoltaic system by using nano-imprint lithography. In: Applied Surface Science. 2017.
@article{b303e8c49e8a4c09a0ca1ea50fc5068a,
title = "Design and fabrication of spectrally selective emitter for thermophotovoltaic system by using nano-imprint lithography",
abstract = "Thermophotovoltaic (TPV) systems have attracted attention as promising power generation systems that can directly convert the radiant energy produced by the combustion of fuel into electrical energy. However, there is a fundamental limit of their conversion efficiency due to the broadband distribution of the radiant spectrum. To overcome this problem, several spectrally selective thermal emitter technologies have been investigated, including the fabrication of photonic crystal (PhC) structures. In this paper, we present some design rules based on finite-a difference time-domain (FDTD) simulation results for tungsten (W) PhC emitter. The W 2D PhC was fabricated by a simple nano-imprint lithography (NIL) process, and inductive coupled plasma reactive ion etching (ICP-RIE) with an isotropic etching process, the benefits and parameters of which are presented. The fabricated W PhC emitter showed spectrally selective emission near the infrared wavelength range, and the optical properties varied depending on the size of the nano-patterns. The measured results of the fabricated prototype structure correspond well to the simulated values. Finally, compared with the performance of a flat W emitter, the total thermal emitter efficiency was almost 3.25 times better with the 2D W PhC structure.",
keywords = "Nano-imprint lithography, Photonic crystal, Thermal emitter, Thermophotovoltaic",
author = "Kim, {Jong Moo} and Park, {Keum Hwan} and Kim, {Da Som} and Hwang, {Bo yeon} and Kim, {Sun Kyung} and Chae, {Hee Man} and Ju, {Byeong Kwon} and Kim, {Young Seok}",
year = "2017",
doi = "10.1016/j.apsusc.2017.07.300",
language = "English",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",

}

TY - JOUR

T1 - Design and fabrication of spectrally selective emitter for thermophotovoltaic system by using nano-imprint lithography

AU - Kim, Jong Moo

AU - Park, Keum Hwan

AU - Kim, Da Som

AU - Hwang, Bo yeon

AU - Kim, Sun Kyung

AU - Chae, Hee Man

AU - Ju, Byeong Kwon

AU - Kim, Young Seok

PY - 2017

Y1 - 2017

N2 - Thermophotovoltaic (TPV) systems have attracted attention as promising power generation systems that can directly convert the radiant energy produced by the combustion of fuel into electrical energy. However, there is a fundamental limit of their conversion efficiency due to the broadband distribution of the radiant spectrum. To overcome this problem, several spectrally selective thermal emitter technologies have been investigated, including the fabrication of photonic crystal (PhC) structures. In this paper, we present some design rules based on finite-a difference time-domain (FDTD) simulation results for tungsten (W) PhC emitter. The W 2D PhC was fabricated by a simple nano-imprint lithography (NIL) process, and inductive coupled plasma reactive ion etching (ICP-RIE) with an isotropic etching process, the benefits and parameters of which are presented. The fabricated W PhC emitter showed spectrally selective emission near the infrared wavelength range, and the optical properties varied depending on the size of the nano-patterns. The measured results of the fabricated prototype structure correspond well to the simulated values. Finally, compared with the performance of a flat W emitter, the total thermal emitter efficiency was almost 3.25 times better with the 2D W PhC structure.

AB - Thermophotovoltaic (TPV) systems have attracted attention as promising power generation systems that can directly convert the radiant energy produced by the combustion of fuel into electrical energy. However, there is a fundamental limit of their conversion efficiency due to the broadband distribution of the radiant spectrum. To overcome this problem, several spectrally selective thermal emitter technologies have been investigated, including the fabrication of photonic crystal (PhC) structures. In this paper, we present some design rules based on finite-a difference time-domain (FDTD) simulation results for tungsten (W) PhC emitter. The W 2D PhC was fabricated by a simple nano-imprint lithography (NIL) process, and inductive coupled plasma reactive ion etching (ICP-RIE) with an isotropic etching process, the benefits and parameters of which are presented. The fabricated W PhC emitter showed spectrally selective emission near the infrared wavelength range, and the optical properties varied depending on the size of the nano-patterns. The measured results of the fabricated prototype structure correspond well to the simulated values. Finally, compared with the performance of a flat W emitter, the total thermal emitter efficiency was almost 3.25 times better with the 2D W PhC structure.

KW - Nano-imprint lithography

KW - Photonic crystal

KW - Thermal emitter

KW - Thermophotovoltaic

UR - http://www.scopus.com/inward/record.url?scp=85028358763&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85028358763&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2017.07.300

DO - 10.1016/j.apsusc.2017.07.300

M3 - Article

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

ER -