Design and fabrication of spectrally selective emitter for thermophotovoltaic system by using nano-imprint lithography

Jong Moo Kim, Keum Hwan Park, Da Som Kim, Bo yeon Hwang, Sun Kyung Kim, Hee Man Chae, Byeong Kwon Ju, Young Seok Kim

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Thermophotovoltaic (TPV) systems have attracted attention as promising power generation systems that can directly convert the radiant energy produced by the combustion of fuel into electrical energy. However, there is a fundamental limit of their conversion efficiency due to the broadband distribution of the radiant spectrum. To overcome this problem, several spectrally selective thermal emitter technologies have been investigated, including the fabrication of photonic crystal (PhC) structures. In this paper, we present some design rules based on finite-a difference time-domain (FDTD) simulation results for tungsten (W) PhC emitter. The W 2D PhC was fabricated by a simple nano-imprint lithography (NIL) process, and inductive coupled plasma reactive ion etching (ICP-RIE) with an isotropic etching process, the benefits and parameters of which are presented. The fabricated W PhC emitter showed spectrally selective emission near the infrared wavelength range, and the optical properties varied depending on the size of the nano-patterns. The measured results of the fabricated prototype structure correspond well to the simulated values. Finally, compared with the performance of a flat W emitter, the total thermal emitter efficiency was almost 3.25 times better with the 2D W PhC structure.

Original languageEnglish
JournalApplied Surface Science
DOIs
Publication statusAccepted/In press - 2017

Keywords

  • Nano-imprint lithography
  • Photonic crystal
  • Thermal emitter
  • Thermophotovoltaic

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

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