Design and optimization of a 200 GHz SiGe HBT collector profile by TCAD

Andreas D. Stricker, Jeffrey B. Johnson, Greg Freeman, Jae-Sung Rieh

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A novel simulation assisted investigation was used to obtain the optimum collector design of a 200GHz silicon-germanium (SiGe) hetero junction bipolar transistor (HBT) for manufacturing. Technology computer aided design (TCAD) tools were applied in a stepwise methodology to explore the large and complex design space and to fully understand the tradeoffs between all relevant HBT performance parameters.

Original languageEnglish
Pages (from-to)324-329
Number of pages6
JournalApplied Surface Science
Volume224
Issue number1-4
DOIs
Publication statusPublished - 2004 Mar 15
Externally publishedYes

Fingerprint

Germanium
junction transistors
Bipolar transistors
Silicon
computer aided design
bipolar transistors
accumulators
germanium
Computer aided design
optimization
silicon
tradeoffs
profiles
manufacturing
methodology
simulation

Keywords

  • BJT
  • Collector doping profile
  • Design methodology
  • HBT
  • Hetero bipolar junction transistor
  • SiGe
  • TCAD

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics

Cite this

Design and optimization of a 200 GHz SiGe HBT collector profile by TCAD. / Stricker, Andreas D.; Johnson, Jeffrey B.; Freeman, Greg; Rieh, Jae-Sung.

In: Applied Surface Science, Vol. 224, No. 1-4, 15.03.2004, p. 324-329.

Research output: Contribution to journalArticle

Stricker, Andreas D. ; Johnson, Jeffrey B. ; Freeman, Greg ; Rieh, Jae-Sung. / Design and optimization of a 200 GHz SiGe HBT collector profile by TCAD. In: Applied Surface Science. 2004 ; Vol. 224, No. 1-4. pp. 324-329.
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