Abstract
A novel simulation assisted investigation was used to obtain the optimum collector design of a 200GHz silicon-germanium (SiGe) hetero junction bipolar transistor (HBT) for manufacturing. Technology computer aided design (TCAD) tools were applied in a stepwise methodology to explore the large and complex design space and to fully understand the tradeoffs between all relevant HBT performance parameters.
Original language | English |
---|---|
Pages (from-to) | 324-329 |
Number of pages | 6 |
Journal | Applied Surface Science |
Volume | 224 |
Issue number | 1-4 |
DOIs | |
Publication status | Published - 2004 Mar 15 |
Externally published | Yes |
Keywords
- BJT
- Collector doping profile
- Design methodology
- HBT
- Hetero bipolar junction transistor
- SiGe
- TCAD
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Surfaces, Coatings and Films