Development of robust batch-fabrication process for high performance sthm probe and quantitative performance evaluation

Kwangseok Hwang, Kyeongtae Kim, Jaehoon Chung, Ohmyoung Kwon, Byeonghee Lee, Joon Sik Lee, Seungho Park, Young Ki Choi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

To guarantee the reproducibility, uniformity and high yield of the fabrication results even with the unavoidable disturbances during the process, the robustness of the batch fabrication process of SThM probes has been improved. First, the shape of the hard mask used for the anisotropic tip etching was redesigned to fit to certain crystal surfaces of silicon wafer so that the sharpness of the tip is kept for a while even after the hard mask falls apart during the bulk tip etch process. Second, the aspect ratio of the tip was maximized by utilizing high concentration KOH solution. Third, the uniformity of etch rate across the wafer was improved by using ultrasonic bath during the anisotropic wet tip etching step. Through the synergistic effects of the modifications of the key steps, the tip fabrication process has become very robust and uniform. Taking advantage of the robustness of the process, we reduced the tip radius of the SThM probe down to 50 nm and the diameter of the thermocouple junction located at the end of the tip to 100 nm. As a result, the sensitivity and the spatial resolution of the new probe were demonstrated to be improved more than two times.

Original languageEnglish
Title of host publicationProceedings of the ASME Micro/Nanoscale Heat and Mass Transfer International Conference 2009, MNHMT2009
Pages421-425
Number of pages5
DOIs
Publication statusPublished - 2010
EventASME 2009 Micro/Nanoscale Heat and Mass Transfer International Conference 2009, MNHMT2009 - Shanghai, China
Duration: 2009 Dec 182009 Dec 21

Publication series

NameProceedings of the ASME Micro/Nanoscale Heat and Mass Transfer International Conference 2009, MNHMT2009
Volume2

Other

OtherASME 2009 Micro/Nanoscale Heat and Mass Transfer International Conference 2009, MNHMT2009
CountryChina
CityShanghai
Period09/12/1809/12/21

Keywords

  • Batch-fabrication
  • Robust process
  • SThM (Scanning Thermal Microscope)
  • Sensitivity
  • Spatial resolution
  • Uniformity

ASJC Scopus subject areas

  • Fluid Flow and Transfer Processes

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  • Cite this

    Hwang, K., Kim, K., Chung, J., Kwon, O., Lee, B., Lee, J. S., Park, S., & Choi, Y. K. (2010). Development of robust batch-fabrication process for high performance sthm probe and quantitative performance evaluation. In Proceedings of the ASME Micro/Nanoscale Heat and Mass Transfer International Conference 2009, MNHMT2009 (pp. 421-425). (Proceedings of the ASME Micro/Nanoscale Heat and Mass Transfer International Conference 2009, MNHMT2009; Vol. 2). https://doi.org/10.1115/MNHMT2009-18218