Dielectric properties of single crystal Sr2Nb3O10 dielectric nanosheet thin films by electrophoretic deposition (EPD) and post deposition treatments

Young Shin Lee, Haena Yim, So Yeon Yoo, Byeong Kwon Ju, Ji Won Choi

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Sr2Nb3O10 (SNO) nanosheets were obtained by exfoliating from a perovskite layered structure of HSr2Nb3O10 (HSNO). The nanosheets were deposited on substrates simultaneously with unintended tetrabutylammonium cations (TBA+) by electrophoretic deposition (EPD) process. To eliminate TBA+ from the SNO dielectric nanosheet thin films, the films were exposed to ultraviolet (UV). Since UV exposure can't decompose TBA+ completely, thermal annealing was additionally conducted by employing different furnaces at various atmospheres. XRD shows the reduction in lattice constant after UV and thermal treatments, indicating that TBA cations were decomposed in the interlayer of nanosheets. FT-IR spectra analysis depicted that the organic materials were eliminated through the post deposition treatments. In addition, XPS data indicated that films treated by a combination of UV and thermal had a lower relative atomic ratio of carbon and nitrogen than as-deposited and only-UV treated films. The optimum process conditions for improving dielectric properties were UV exposure for 15 h and subsequent thermal annealing in a box furnace in the air at 600 °C for 1 h. When compared to the as-deposited film, the dielectric constants of films further annealed by the box furnace in the air were increased from 8 to 27 at 1 MHz whereas dielectric loss (tan δ) decreased from 5% to 2%. Additional thermal treatment strongly affects nanosheets to decompose TBA+.

Original languageEnglish
Pages (from-to)51-57
Number of pages7
JournalJournal of Alloys and Compounds
Volume711
DOIs
Publication statusPublished - 2017 Jul 15

Fingerprint

Nanosheets
Dielectric properties
Single crystals
Thin films
Furnaces
Cations
Positive ions
Heat treatment
Annealing
Dielectric losses
Air
Perovskite
Spectrum analysis
Lattice constants
Permittivity
Nitrogen
Carbon
X ray photoelectron spectroscopy
Substrates
Hot Temperature

Keywords

  • Dielectric properties
  • Electrophoretic deposition
  • Nanosheet
  • Post treatment

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys
  • Materials Chemistry

Cite this

Dielectric properties of single crystal Sr2Nb3O10 dielectric nanosheet thin films by electrophoretic deposition (EPD) and post deposition treatments. / Lee, Young Shin; Yim, Haena; Yoo, So Yeon; Ju, Byeong Kwon; Choi, Ji Won.

In: Journal of Alloys and Compounds, Vol. 711, 15.07.2017, p. 51-57.

Research output: Contribution to journalArticle

@article{0091cefdd22747a597a0c55d04b56a39,
title = "Dielectric properties of single crystal Sr2Nb3O10 dielectric nanosheet thin films by electrophoretic deposition (EPD) and post deposition treatments",
abstract = "Sr2Nb3O10 (SNO) nanosheets were obtained by exfoliating from a perovskite layered structure of HSr2Nb3O10 (HSNO). The nanosheets were deposited on substrates simultaneously with unintended tetrabutylammonium cations (TBA+) by electrophoretic deposition (EPD) process. To eliminate TBA+ from the SNO dielectric nanosheet thin films, the films were exposed to ultraviolet (UV). Since UV exposure can't decompose TBA+ completely, thermal annealing was additionally conducted by employing different furnaces at various atmospheres. XRD shows the reduction in lattice constant after UV and thermal treatments, indicating that TBA cations were decomposed in the interlayer of nanosheets. FT-IR spectra analysis depicted that the organic materials were eliminated through the post deposition treatments. In addition, XPS data indicated that films treated by a combination of UV and thermal had a lower relative atomic ratio of carbon and nitrogen than as-deposited and only-UV treated films. The optimum process conditions for improving dielectric properties were UV exposure for 15 h and subsequent thermal annealing in a box furnace in the air at 600 °C for 1 h. When compared to the as-deposited film, the dielectric constants of films further annealed by the box furnace in the air were increased from 8 to 27 at 1 MHz whereas dielectric loss (tan δ) decreased from 5{\%} to 2{\%}. Additional thermal treatment strongly affects nanosheets to decompose TBA+.",
keywords = "Dielectric properties, Electrophoretic deposition, Nanosheet, Post treatment",
author = "Lee, {Young Shin} and Haena Yim and Yoo, {So Yeon} and Ju, {Byeong Kwon} and Choi, {Ji Won}",
year = "2017",
month = "7",
day = "15",
doi = "10.1016/j.jallcom.2017.03.342",
language = "English",
volume = "711",
pages = "51--57",
journal = "Journal of Alloys and Compounds",
issn = "0925-8388",
publisher = "Elsevier BV",

}

TY - JOUR

T1 - Dielectric properties of single crystal Sr2Nb3O10 dielectric nanosheet thin films by electrophoretic deposition (EPD) and post deposition treatments

AU - Lee, Young Shin

AU - Yim, Haena

AU - Yoo, So Yeon

AU - Ju, Byeong Kwon

AU - Choi, Ji Won

PY - 2017/7/15

Y1 - 2017/7/15

N2 - Sr2Nb3O10 (SNO) nanosheets were obtained by exfoliating from a perovskite layered structure of HSr2Nb3O10 (HSNO). The nanosheets were deposited on substrates simultaneously with unintended tetrabutylammonium cations (TBA+) by electrophoretic deposition (EPD) process. To eliminate TBA+ from the SNO dielectric nanosheet thin films, the films were exposed to ultraviolet (UV). Since UV exposure can't decompose TBA+ completely, thermal annealing was additionally conducted by employing different furnaces at various atmospheres. XRD shows the reduction in lattice constant after UV and thermal treatments, indicating that TBA cations were decomposed in the interlayer of nanosheets. FT-IR spectra analysis depicted that the organic materials were eliminated through the post deposition treatments. In addition, XPS data indicated that films treated by a combination of UV and thermal had a lower relative atomic ratio of carbon and nitrogen than as-deposited and only-UV treated films. The optimum process conditions for improving dielectric properties were UV exposure for 15 h and subsequent thermal annealing in a box furnace in the air at 600 °C for 1 h. When compared to the as-deposited film, the dielectric constants of films further annealed by the box furnace in the air were increased from 8 to 27 at 1 MHz whereas dielectric loss (tan δ) decreased from 5% to 2%. Additional thermal treatment strongly affects nanosheets to decompose TBA+.

AB - Sr2Nb3O10 (SNO) nanosheets were obtained by exfoliating from a perovskite layered structure of HSr2Nb3O10 (HSNO). The nanosheets were deposited on substrates simultaneously with unintended tetrabutylammonium cations (TBA+) by electrophoretic deposition (EPD) process. To eliminate TBA+ from the SNO dielectric nanosheet thin films, the films were exposed to ultraviolet (UV). Since UV exposure can't decompose TBA+ completely, thermal annealing was additionally conducted by employing different furnaces at various atmospheres. XRD shows the reduction in lattice constant after UV and thermal treatments, indicating that TBA cations were decomposed in the interlayer of nanosheets. FT-IR spectra analysis depicted that the organic materials were eliminated through the post deposition treatments. In addition, XPS data indicated that films treated by a combination of UV and thermal had a lower relative atomic ratio of carbon and nitrogen than as-deposited and only-UV treated films. The optimum process conditions for improving dielectric properties were UV exposure for 15 h and subsequent thermal annealing in a box furnace in the air at 600 °C for 1 h. When compared to the as-deposited film, the dielectric constants of films further annealed by the box furnace in the air were increased from 8 to 27 at 1 MHz whereas dielectric loss (tan δ) decreased from 5% to 2%. Additional thermal treatment strongly affects nanosheets to decompose TBA+.

KW - Dielectric properties

KW - Electrophoretic deposition

KW - Nanosheet

KW - Post treatment

UR - http://www.scopus.com/inward/record.url?scp=85016780981&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85016780981&partnerID=8YFLogxK

U2 - 10.1016/j.jallcom.2017.03.342

DO - 10.1016/j.jallcom.2017.03.342

M3 - Article

VL - 711

SP - 51

EP - 57

JO - Journal of Alloys and Compounds

JF - Journal of Alloys and Compounds

SN - 0925-8388

ER -