Diffraction phase microscopy: Monitoring nanoscale dynamics in materials science [invited]

Chris Edwards, Renjie Zhou, Suk-Won Hwang, Steven J. McKeown, Kaiyuan Wang, Basanta Bhaduri, Raman Ganti, Peter J. Yunker, Arjun G. Yodh, John A. Rogers, Lynford L. Goddard, Gabriel Popescu

Research output: Contribution to journalArticle

27 Citations (Scopus)

Abstract

Quantitative phase imaging (QPI) utilizes the fact that the phase of an imaging field is much more sensitive than its amplitude. As fields from the source interact with the specimen, local variations in the phase front are produced, which provide structural information about the sample and can be used to reconstruct its topography with nanometer accuracy. QPI techniques do not require staining or coating of the specimen and are therefore nondestructive. Diffraction phase microscopy (DPM) combines many of the best attributes of current QPI methods; its compact configuration uses a common-path off-axis geometry which realizes the benefits of both low noise and single-shot imaging. This unique collection of features enables the DPM system to monitor, at the nanoscale, a wide variety of phenomena in their natural environments. Over the past decade, QPI techniques have become ubiquitous in biological studies and a recent effort has been made to extend QPI to materials science applications. We briefly review several recent studies which include real-time monitoring of wet etching, photochemical etching, surface wetting and evaporation, dissolution of biodegradable electronic materials, and the expansion and deformation of thin-films. We also discuss recent advances in semiconductor wafer defect detection using QPI.

Original languageEnglish
Pages (from-to)G33-G43
JournalApplied Optics
Volume53
Issue number27
DOIs
Publication statusPublished - 2014 Sep 20
Externally publishedYes

Fingerprint

Materials science
materials science
imaging techniques
Microscopic examination
Diffraction
etching
microscopy
Imaging techniques
Monitoring
staining
diffraction
low noise
shot
wetting
topography
dissolving
evaporation
wafers
coatings
expansion

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)

Cite this

Edwards, C., Zhou, R., Hwang, S-W., McKeown, S. J., Wang, K., Bhaduri, B., ... Popescu, G. (2014). Diffraction phase microscopy: Monitoring nanoscale dynamics in materials science [invited]. Applied Optics, 53(27), G33-G43. https://doi.org/10.1364/AO.53.000G33

Diffraction phase microscopy : Monitoring nanoscale dynamics in materials science [invited]. / Edwards, Chris; Zhou, Renjie; Hwang, Suk-Won; McKeown, Steven J.; Wang, Kaiyuan; Bhaduri, Basanta; Ganti, Raman; Yunker, Peter J.; Yodh, Arjun G.; Rogers, John A.; Goddard, Lynford L.; Popescu, Gabriel.

In: Applied Optics, Vol. 53, No. 27, 20.09.2014, p. G33-G43.

Research output: Contribution to journalArticle

Edwards, C, Zhou, R, Hwang, S-W, McKeown, SJ, Wang, K, Bhaduri, B, Ganti, R, Yunker, PJ, Yodh, AG, Rogers, JA, Goddard, LL & Popescu, G 2014, 'Diffraction phase microscopy: Monitoring nanoscale dynamics in materials science [invited]', Applied Optics, vol. 53, no. 27, pp. G33-G43. https://doi.org/10.1364/AO.53.000G33
Edwards, Chris ; Zhou, Renjie ; Hwang, Suk-Won ; McKeown, Steven J. ; Wang, Kaiyuan ; Bhaduri, Basanta ; Ganti, Raman ; Yunker, Peter J. ; Yodh, Arjun G. ; Rogers, John A. ; Goddard, Lynford L. ; Popescu, Gabriel. / Diffraction phase microscopy : Monitoring nanoscale dynamics in materials science [invited]. In: Applied Optics. 2014 ; Vol. 53, No. 27. pp. G33-G43.
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