Direct Photolithographic Patterning of Colloidal Quantum Dots Enabled by UV-Crosslinkable and Hole-Transporting Polymer Ligands

Jaewan Ko; Jun Hyuk Chang; Byeong Guk Jeong; Hyung Jong Kim; Joonyoung F. Joung; Sungnam Park; Dong Hoon Choi; Wan Ki Bae; Joona Bang

doi:10.1021/acsami.0c11988

Direct Photolithographic Patterning of Colloidal Quantum Dots Enabled by UV-Crosslinkable and Hole-Transporting Polymer Ligands

Jaewan Ko, Jun Hyuk Chang, Byeong Guk Jeong, Hyung Jong Kim, Joonyoung F. Joung, Sungnam Park, Dong Hoon Choi, Wan Ki Bae, Joona Bang

Research output: Contribution to journal › Article › peer-review

19 Citations (Scopus)

Abstract

Quantum dot (QD)-based displays call for nondestructive, high-throughput, and high-resolution patterning techniques with micrometer precision. In particular, self-emissive QD-based displays demand fine patterns of conductive QD films with uniform thickness at the nanometer scale. To meet these requirements, we functionalized QDs with photopatternable and semiconducting poly(vinyltriphenylamine-random-azidostyrene) (PTPA-N3-SH) ligands in which hole-transporting triphenylamine and UV-crosslinkable azide (-N3) groups are integrated. The hybridized QD films undergo chemical crosslinking upon UV irradiation without loss in the luminescence efficiency, enabling micrometer-scale QD patterns (pitch size down to ∼10 μm) via direct photolithography. In addition, the conjugated moieties in the ligands allow the crosslinked QD films to be used in electrically driven light-emitting diodes (LED). As the ultimate achievement, a patterned QD-LED was prepared with a maximum luminance of 11720 cd m-2 and a maximum external quantum efficiency (EQE) of 6.25%. The present study offers a simple platform to fabricate conductive nanoparticle films with micrometer-scale patterns, and thus we anticipate that this system will expedite the realization of QD-based displays and will also be applicable to the manufacture of nanoparticles for other electronic devices.

Original language	English
Pages (from-to)	42153-42160
Number of pages	8
Journal	ACS Applied Materials and Interfaces
Volume	12
Issue number	37
DOIs	https://doi.org/10.1021/acsami.0c11988
Publication status	Published - 2020 Sept 16

Keywords

UV crosslinking
colloidal quantum dots
light-emitting diodes
micropatterns
photolithography
polymer ligands

ASJC Scopus subject areas

Materials Science(all)

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10.1021/acsami.0c11988

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@article{03dc1e95c41c493e96665a6244990047,

title = "Direct Photolithographic Patterning of Colloidal Quantum Dots Enabled by UV-Crosslinkable and Hole-Transporting Polymer Ligands",

abstract = "Quantum dot (QD)-based displays call for nondestructive, high-throughput, and high-resolution patterning techniques with micrometer precision. In particular, self-emissive QD-based displays demand fine patterns of conductive QD films with uniform thickness at the nanometer scale. To meet these requirements, we functionalized QDs with photopatternable and semiconducting poly(vinyltriphenylamine-random-azidostyrene) (PTPA-N3-SH) ligands in which hole-transporting triphenylamine and UV-crosslinkable azide (-N3) groups are integrated. The hybridized QD films undergo chemical crosslinking upon UV irradiation without loss in the luminescence efficiency, enabling micrometer-scale QD patterns (pitch size down to ∼10 μm) via direct photolithography. In addition, the conjugated moieties in the ligands allow the crosslinked QD films to be used in electrically driven light-emitting diodes (LED). As the ultimate achievement, a patterned QD-LED was prepared with a maximum luminance of 11720 cd m-2 and a maximum external quantum efficiency (EQE) of 6.25%. The present study offers a simple platform to fabricate conductive nanoparticle films with micrometer-scale patterns, and thus we anticipate that this system will expedite the realization of QD-based displays and will also be applicable to the manufacture of nanoparticles for other electronic devices. ",

keywords = "UV crosslinking, colloidal quantum dots, light-emitting diodes, micropatterns, photolithography, polymer ligands",

author = "Jaewan Ko and Chang, {Jun Hyuk} and Jeong, {Byeong Guk} and Kim, {Hyung Jong} and Joung, {Joonyoung F.} and Sungnam Park and Choi, {Dong Hoon} and Bae, {Wan Ki} and Joona Bang",

note = "Funding Information: This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIT) (No. 2018R1A2B2004508) and also by the Creative Materials Discovery Program through NRF grant funded by MSIT (No. 2018M3D1A1058536). W. K. Bae and D. H. Choi also acknowledge the support by NRF grant funded by MSIT (Nos. 2020M3D1A2101310 and 2019R1A6A1A11044070, respectively). This work was also supported by LG Display under the LGD-KU Incubation Program. Publisher Copyright: Copyright {\textcopyright} 2020 American Chemical Society.",

year = "2020",

month = sep,

day = "16",

doi = "10.1021/acsami.0c11988",

language = "English",

volume = "12",

pages = "42153--42160",

journal = "ACS applied materials & interfaces",

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publisher = "American Chemical Society",

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T1 - Direct Photolithographic Patterning of Colloidal Quantum Dots Enabled by UV-Crosslinkable and Hole-Transporting Polymer Ligands

AU - Ko, Jaewan

AU - Chang, Jun Hyuk

AU - Jeong, Byeong Guk

AU - Kim, Hyung Jong

AU - Joung, Joonyoung F.

AU - Park, Sungnam

AU - Choi, Dong Hoon

AU - Bae, Wan Ki

AU - Bang, Joona

N1 - Funding Information: This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIT) (No. 2018R1A2B2004508) and also by the Creative Materials Discovery Program through NRF grant funded by MSIT (No. 2018M3D1A1058536). W. K. Bae and D. H. Choi also acknowledge the support by NRF grant funded by MSIT (Nos. 2020M3D1A2101310 and 2019R1A6A1A11044070, respectively). This work was also supported by LG Display under the LGD-KU Incubation Program. Publisher Copyright: Copyright © 2020 American Chemical Society.

PY - 2020/9/16

Y1 - 2020/9/16

N2 - Quantum dot (QD)-based displays call for nondestructive, high-throughput, and high-resolution patterning techniques with micrometer precision. In particular, self-emissive QD-based displays demand fine patterns of conductive QD films with uniform thickness at the nanometer scale. To meet these requirements, we functionalized QDs with photopatternable and semiconducting poly(vinyltriphenylamine-random-azidostyrene) (PTPA-N3-SH) ligands in which hole-transporting triphenylamine and UV-crosslinkable azide (-N3) groups are integrated. The hybridized QD films undergo chemical crosslinking upon UV irradiation without loss in the luminescence efficiency, enabling micrometer-scale QD patterns (pitch size down to ∼10 μm) via direct photolithography. In addition, the conjugated moieties in the ligands allow the crosslinked QD films to be used in electrically driven light-emitting diodes (LED). As the ultimate achievement, a patterned QD-LED was prepared with a maximum luminance of 11720 cd m-2 and a maximum external quantum efficiency (EQE) of 6.25%. The present study offers a simple platform to fabricate conductive nanoparticle films with micrometer-scale patterns, and thus we anticipate that this system will expedite the realization of QD-based displays and will also be applicable to the manufacture of nanoparticles for other electronic devices.

AB - Quantum dot (QD)-based displays call for nondestructive, high-throughput, and high-resolution patterning techniques with micrometer precision. In particular, self-emissive QD-based displays demand fine patterns of conductive QD films with uniform thickness at the nanometer scale. To meet these requirements, we functionalized QDs with photopatternable and semiconducting poly(vinyltriphenylamine-random-azidostyrene) (PTPA-N3-SH) ligands in which hole-transporting triphenylamine and UV-crosslinkable azide (-N3) groups are integrated. The hybridized QD films undergo chemical crosslinking upon UV irradiation without loss in the luminescence efficiency, enabling micrometer-scale QD patterns (pitch size down to ∼10 μm) via direct photolithography. In addition, the conjugated moieties in the ligands allow the crosslinked QD films to be used in electrically driven light-emitting diodes (LED). As the ultimate achievement, a patterned QD-LED was prepared with a maximum luminance of 11720 cd m-2 and a maximum external quantum efficiency (EQE) of 6.25%. The present study offers a simple platform to fabricate conductive nanoparticle films with micrometer-scale patterns, and thus we anticipate that this system will expedite the realization of QD-based displays and will also be applicable to the manufacture of nanoparticles for other electronic devices.

KW - UV crosslinking

KW - colloidal quantum dots

KW - light-emitting diodes

KW - micropatterns

KW - photolithography

KW - polymer ligands

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U2 - 10.1021/acsami.0c11988

DO - 10.1021/acsami.0c11988

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ER -

Direct Photolithographic Patterning of Colloidal Quantum Dots Enabled by UV-Crosslinkable and Hole-Transporting Polymer Ligands

Abstract

Keywords

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