Direct-write nanolighography on flexible substrate

Jiyoung Chang, Michael Dommer, Byung Yang Lee, Liwei Lin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper presents a mask-less lithography process using direct-write nanofibers via near-field electrospinning on flexible substrate as masking materials in processes such as lift-off, wet-etching and dry-etching. The polymer fibers have diameter of sub-micrometer to micrometer with good adhesion to substrate and chemical sustainability. Key demonstrations successfully realized in this work include sub-micrometer metal gaps, micro heaters and definition of graphene structures on flexible substrates. As such, this direct-write lithography technique could find applications in low-cost microelectronics, including flexible electronics.

Original languageEnglish
Title of host publicationTechnical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop
PublisherTransducer Research Foundation
Pages441-444
Number of pages4
ISBN (Print)9780964002494
Publication statusPublished - 2012
Externally publishedYes
Event2012 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2012 - Hilton Head, United States
Duration: 2012 Jun 32012 Jun 7

Other

Other2012 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2012
CountryUnited States
CityHilton Head
Period12/6/312/6/7

Keywords

  • Electrospinning
  • Flexible electronics
  • Mask-less lithography

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Hardware and Architecture

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  • Cite this

    Chang, J., Dommer, M., Lee, B. Y., & Lin, L. (2012). Direct-write nanolighography on flexible substrate. In Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop (pp. 441-444). Transducer Research Foundation.