Directed assembly of high molecular weight block copolymers

Highly ordered line patterns of perpendicularly oriented lamellae with large periods

Eunhye Kim, Hyungju Ahn, Sungmin Park, Hoyeon Lee, Moongyu Lee, Sumi Lee, Taewoo Kim, Eun Ae Kwak, Jun Han Lee, Xie Lei, June Huh, Joona Bang, Byeongdu Lee, Du Yeol Ryu

Research output: Contribution to journalArticle

74 Citations (Scopus)

Abstract

The directed assembly of block copolymer nanostructures with large periods exceeding 100 nm remains challenging because the translational ordering of long-chained block copolymer is hindered by its very low chain mobility. Using a solvent-vapor annealing process with a neutral solvent, which was sequentially combined with a thermal annealing process, we demonstrate the rapid evolution of a perpendicularly oriented lamellar morphology in high molecular weight block copolymer films on neutral substrate. The synergy with the topographically patterned substrate facilitated unidirectionally structural development of ultrahigh molecular weight block copolymer thin films - even for the structures with a large period of 200 nm - leading to perfectly guided, parallel, and highly ordered line-arrays of perpendicularly oriented lamellae in the trenched confinement. This breakthrough strategy, which is applicable to nanolithographic pattern transfer to target substrates, can be a simple and efficient route to satisfy the demand for block copolymer assemblies with larger feature sizes on hundreds of nanometers scale.

Original languageEnglish
Pages (from-to)1952-1960
Number of pages9
JournalACS Nano
Volume7
Issue number3
DOIs
Publication statusPublished - 2013 Mar 26

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lamella
block copolymers
Block copolymers
molecular weight
assembly
Molecular weight
Substrates
Annealing
annealing
assemblies
Nanostructures
Vapors
routes
vapors
Thin films
thin films

Keywords

  • block copolymer
  • exceeding 100 nm
  • high molecular weight
  • perpendicularly oriented lamellae
  • solvent-vapor annealing

ASJC Scopus subject areas

  • Engineering(all)
  • Materials Science(all)
  • Physics and Astronomy(all)

Cite this

Directed assembly of high molecular weight block copolymers : Highly ordered line patterns of perpendicularly oriented lamellae with large periods. / Kim, Eunhye; Ahn, Hyungju; Park, Sungmin; Lee, Hoyeon; Lee, Moongyu; Lee, Sumi; Kim, Taewoo; Kwak, Eun Ae; Lee, Jun Han; Lei, Xie; Huh, June; Bang, Joona; Lee, Byeongdu; Ryu, Du Yeol.

In: ACS Nano, Vol. 7, No. 3, 26.03.2013, p. 1952-1960.

Research output: Contribution to journalArticle

Kim, E, Ahn, H, Park, S, Lee, H, Lee, M, Lee, S, Kim, T, Kwak, EA, Lee, JH, Lei, X, Huh, J, Bang, J, Lee, B & Ryu, DY 2013, 'Directed assembly of high molecular weight block copolymers: Highly ordered line patterns of perpendicularly oriented lamellae with large periods', ACS Nano, vol. 7, no. 3, pp. 1952-1960. https://doi.org/10.1021/nn3051264
Kim, Eunhye ; Ahn, Hyungju ; Park, Sungmin ; Lee, Hoyeon ; Lee, Moongyu ; Lee, Sumi ; Kim, Taewoo ; Kwak, Eun Ae ; Lee, Jun Han ; Lei, Xie ; Huh, June ; Bang, Joona ; Lee, Byeongdu ; Ryu, Du Yeol. / Directed assembly of high molecular weight block copolymers : Highly ordered line patterns of perpendicularly oriented lamellae with large periods. In: ACS Nano. 2013 ; Vol. 7, No. 3. pp. 1952-1960.
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