Directional photofluidization lithography for nanoarchitectures with controlled shapes and sizes

Seungwoo Lee, Jonghwa Shin, Yong Hee Lee, Shanhui Fan, Jung Ki Park

Research output: Contribution to journalArticle

49 Citations (Scopus)

Abstract

Highly ordered metallic nanostructures have attracted an increasing interest in nanoscale electronics, photonics, and spectroscopic imaging. However, methods typically used for fabricating metallic nanostructures, such as direct writing and templatebased nanolithography, have low throughput and are, moreover, limited to specific fabricated shapes such as holes, lines, and prisms, respectively. Herein, we demonstrate directional photofluidization lithography (DPL) as a new method to address the aforementioned problems of current nanolithography. The key idea of DPL is the use of photoreconfigurable polymer arrays to be molded in metallic nanostructures instead of conventional colloids or cross-linked polymer arrays. The photoreconfiguration of polymers by directional photofluidization allows unprecedented control over the sizes and shapes of metallic nanostructures. Besides the capability for precise control of structural features, DPL ensures scalable, parallel, and cost-effective processing, highly compatible with high-throughput fabrication. Therefore, DPL can expand not only the potential for specific metallic nanostructure applications but also large-scale innovative nanolithography.

Original languageEnglish
Pages (from-to)296-304
Number of pages9
JournalNano Letters
Volume10
Issue number1
DOIs
Publication statusPublished - 2010 Jan 13

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Lithography
Nanostructures
Nanolithography
lithography
Polymers
polymers
Throughput
prisms
colloids
Colloids
Prisms
Photonics
photonics
costs
Electronic equipment
fabrication
Imaging techniques
Fabrication
electronics
Processing

Keywords

  • Surface plasmon resonance, metallic nanostructures, azopolymer, directional photofluidizatior

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

Cite this

Directional photofluidization lithography for nanoarchitectures with controlled shapes and sizes. / Lee, Seungwoo; Shin, Jonghwa; Lee, Yong Hee; Fan, Shanhui; Park, Jung Ki.

In: Nano Letters, Vol. 10, No. 1, 13.01.2010, p. 296-304.

Research output: Contribution to journalArticle

Lee, Seungwoo ; Shin, Jonghwa ; Lee, Yong Hee ; Fan, Shanhui ; Park, Jung Ki. / Directional photofluidization lithography for nanoarchitectures with controlled shapes and sizes. In: Nano Letters. 2010 ; Vol. 10, No. 1. pp. 296-304.
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